Enhancement of Carrier Mobility in Semiconductor Nanostructures by Carrier Distribution Engineering

Two-dimensional (2D) van der Waals semiconductors are appealing for low-power transistors. Here, we show the feasibility in enhancing carrier mobility in 2D semiconductors through engineering the vertical distribution of carriers confined inside ultrathin channels via symmetrizing gate configuration or increasing channel thickness. Through self-consistently solving the Schrödinger–Poisson equations, the shapes of electron envelope functions are extensively investigated by clarifying their relationship with gate configuration, channel thickness, dielectric permittivity, and electron density. The impacts of electron distribution variation on various carrier scattering matrix elements and overall carrier mobility are insightfully clarified. It is found that the carrier mobility can be generally enhanced in the dual-gated configuration due to the centralization of carrier redistribution in the nanometer-thick semiconductor channels and the rate of increase reaches up to 23% in HfO₂ dual-gated 10-layer MoS₂ channels. This finding represents a viable strategy for performance optimization in transistors consisting of 2D semiconductors.