A Ferroelectric Domain-Wall Transistor
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Abstract
On the basis of novel properties of ferroelectric conducting domain walls, the domain wall nanoelectronics emerges and provides a brand-new dimension for the development of high-density, high-speed and energy-efficient nanodevices. For in-memory computing, three-terminal devices with both logic and memory functions such as transistors purely based on ferroelectric domain walls are urgently required. Here, a prototype ferroelectric domain-wall transistor with a well-designed coplanar electrode geometry is demonstrated on epitaxial BiFeO3 thin films. For the logic function, the current switching between on/off states of the transistor depends on the creation or elimination of conducting domain walls between drain and source electrodes. For the data storage, the transistor can maintain nonvolatile on/off states after the write/erase operations, providing an innovative approach for the development of the domain wall nanoelectronics.
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Cite this article:
Yang-Jun Ou, Jie Sun, Yi-Ming Li, An-Quan Jiang. A Ferroelectric Domain-Wall Transistor[J]. Chin. Phys. Lett., 2023, 40(3): 038501. DOI: 10.1088/0256-307X/40/3/038501
Yang-Jun Ou, Jie Sun, Yi-Ming Li, An-Quan Jiang. A Ferroelectric Domain-Wall Transistor[J]. Chin. Phys. Lett., 2023, 40(3): 038501. DOI: 10.1088/0256-307X/40/3/038501
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Yang-Jun Ou, Jie Sun, Yi-Ming Li, An-Quan Jiang. A Ferroelectric Domain-Wall Transistor[J]. Chin. Phys. Lett., 2023, 40(3): 038501. DOI: 10.1088/0256-307X/40/3/038501
Yang-Jun Ou, Jie Sun, Yi-Ming Li, An-Quan Jiang. A Ferroelectric Domain-Wall Transistor[J]. Chin. Phys. Lett., 2023, 40(3): 038501. DOI: 10.1088/0256-307X/40/3/038501
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