Concurrent Structural and Electronic Phase Transitions in V_2O_3 Thin Films with Sharp Resistivity Change

The relationship between structural and electronic phase transitions in V_2O_3 thin films is of critical importance for understanding of the mechanism behind metal–insulator transition (MIT) and related technological applications. Despite being extensively studied, there are currently no clear consensus and picture of the relation between structural and electronic phase transitions so far. Using V_2O_3 thin films grown on r-plane Al_2O_3 substrates, which exhibit abrupt MIT and structural phase transition, we show that the electronic phase transition occurs concurrently with the structural phase transition as revealed by the electrical transport and Raman spectra measurements. Our result provides experimental evidence for clarifying this issue, which could form the basis of theoretical studies as well as technological applications in V_2O_3.