Influence of Al Preflow Time on Surface Morphology and Quality of AlN and GaN on Si (111) Grown by MOCVD

We investigate the influence of Al preflow time on surface morphology and quality of AlN and GaN. The AlN and GaN layers are grown on a Si (111) substrate by metal organic chemical vapor deposition. Scanning electron microscopy, atomic force microscopy, x-ray diffraction and optical microscopy are used for analysis. Consequently, we find significant differences in the epitaxial properties of AlN buffer and the GaN layer, which are dependent on the Al preflow time. Al preflow layers act as nucleation sites in the case of AlN growth. Compact and uniform AlN nucleation sites are observed with optimizing Al preflow at an early nucleation stage, which will lead to a smooth AlN surface. Trenches and AlN grain clusters appear on the AlN surface while melt-back etching occurs on the GaN surface with excessive Al preflow. The GaN quality variation keeps a similar trend with the AlN quality, which is influenced by Al preflow. With an optimized duration of Al preflow, crystal quality and surface morphology of AlN and GaN could be improved.