Characteristics of Resistance Triggering of a Pulsed Vacuum Arc Ion Source
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Abstract
Triggering scheme is a significant factor that may influence the process of vacuum arc initiation. In this work, the characteristics of resistance triggering of a pulsed vacuum arc ion source are investigated and compared with the independent pulse generator triggering. The results show that although the resistance triggering method is capable of triggering a vacuum arc ion source by properly choosing the resistance and electric parameters, it inevitably increases the rise time of the arc current. A high speed multiframe camera is used to reveal the transition process of arc initiation during one shot. From the images it is conjectured that the lower voltage between the cathode and the anode may be the reason that leads to the lower transition speed of discharge at the moment of arc initiation.
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LAN Chao-Hui, LONG Ji-Dong, ZHENG Le, DONG Pan, YANG Zhen, WANG Tao, LI Jie. Characteristics of Resistance Triggering of a Pulsed Vacuum Arc Ion Source[J]. Chin. Phys. Lett., 2015, 32(9): 095201. DOI: 10.1088/0256-307X/32/9/095201
LAN Chao-Hui, LONG Ji-Dong, ZHENG Le, DONG Pan, YANG Zhen, WANG Tao, LI Jie. Characteristics of Resistance Triggering of a Pulsed Vacuum Arc Ion Source[J]. Chin. Phys. Lett., 2015, 32(9): 095201. DOI: 10.1088/0256-307X/32/9/095201
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LAN Chao-Hui, LONG Ji-Dong, ZHENG Le, DONG Pan, YANG Zhen, WANG Tao, LI Jie. Characteristics of Resistance Triggering of a Pulsed Vacuum Arc Ion Source[J]. Chin. Phys. Lett., 2015, 32(9): 095201. DOI: 10.1088/0256-307X/32/9/095201
LAN Chao-Hui, LONG Ji-Dong, ZHENG Le, DONG Pan, YANG Zhen, WANG Tao, LI Jie. Characteristics of Resistance Triggering of a Pulsed Vacuum Arc Ion Source[J]. Chin. Phys. Lett., 2015, 32(9): 095201. DOI: 10.1088/0256-307X/32/9/095201
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