Nano-Crystalline Diamond Films Grown by Radio-Frequency Inductively Coupled Plasma Jet Enhanced Chemical Vapor Deposition

Radio-frequency inductively coupled plasma jet is utilized to grow diamond films to combine the advantages of clean deposition environment and large deposition area. Before diamond growth, the simulation of deposition environment is studied to understand the flow field and the properties of the plasma. The optical emission spectra (OES) are also applied to diagnose the rf plasma. The plasma density n_e and the electron temperature T_e deduced from the data measured by OES are about 1.0×10¹⁴ l/cm³ and 1.4 eV, which are in good agreement with the data calculated in the simulation. Based on the data from both simulation and measurement, the optimized growth parameters are determined to grow diamond films. Nano-crystalline diamond with cauliflower-like morphology is obtained. The crystalline feature and impurity of as-grown films are also studied.