The Cu Based AlGaN/GaN Schottky Barrier Diode
 
             
            
                    
                                        
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Abstract
    The electrical characteristics of Cu and Ni/Al AlGaN/GaN Schottky barrier diodes on Si substrates are compared. The onset voltage of Cu Schottky diodes is about 0.4 V less than the Ni/Al contact. For the Cu/Ni Schottky contact, the leakage current is 4.7×10-7 A/mm at -10 V. After annealing, the leakage current is decreased to 3.7×10-7 A/mm for 400°C or 4.6×10-8 A/mm for 500°C, respectively. The electrical property is affected by the thickness ratio of Cu to Ni. The Cu/Ni for 80/20 nm shows a low onset voltage, while the Cu/Ni for 20/80 nm shows a low leakage current. Both breakdown voltages are above 720 V.
 
 
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                        LI Di, JIA Li-Fang, FAN Zhong-Chao, CHENG Zhe, WANG Xiao-Dong, YANG Fu-Hua, HE Zhi. The Cu Based AlGaN/GaN Schottky Barrier Diode[J]. 
Chin. Phys. Lett., 2015, 32(6): 068502. 
DOI: 10.1088/0256-307X/32/6/068502
                     
                    
                        
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                                LI Di, JIA Li-Fang, FAN Zhong-Chao, CHENG Zhe, WANG Xiao-Dong, YANG Fu-Hua, HE Zhi. The Cu Based AlGaN/GaN Schottky Barrier Diode[J]. Chin. Phys. Lett., 2015, 32(6): 068502. DOI: 10.1088/0256-307X/32/6/068502
                                
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                        LI Di, JIA Li-Fang, FAN Zhong-Chao, CHENG Zhe, WANG Xiao-Dong, YANG Fu-Hua, HE Zhi. The Cu Based AlGaN/GaN Schottky Barrier Diode[J]. Chin. Phys. Lett., 2015, 32(6): 068502. DOI: 10.1088/0256-307X/32/6/068502
                    
                    
                        
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                                LI Di, JIA Li-Fang, FAN Zhong-Chao, CHENG Zhe, WANG Xiao-Dong, YANG Fu-Hua, HE Zhi. The Cu Based AlGaN/GaN Schottky Barrier Diode[J]. Chin. Phys. Lett., 2015, 32(6): 068502. DOI: 10.1088/0256-307X/32/6/068502
                                
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