Fabrication of 32 Gb/s Electroabsorption Modulated Distributed Feedback Lasers by Selective Area Growth Technology
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ZHOU Dai-Bing,
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WANG Hui-Tao,
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ZHANG Rui-Kang,
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WANG Bao-Jun,
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BIAN Jing,
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AN Xin,
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LU Dan,
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ZHAO Ling-Juan,
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ZHU Hong-Liang,
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JI Chen,
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WANG Wei
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Abstract
A 32 Gb/s monolithically integrated electroabsorption modulated laser is fabricated by selective area growth technology. The threshold current of the device is below 13 mA. The output power exceeds 10 mW at 0 V bias when the injection current of the distributed feedback laser is 100 mA at 25°C. The side mode suppression ratio is over 50 dB. A 32Gb/s eye diagram is measured with a 3.5Vpp nonreturn-to-zero pseudorandom modulation signal at -2.3 V bias. A clearly opening eyediagram with a dynamic extinction ratio of 8.01 dB is obtained.
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Cite this article:
ZHOU Dai-Bing, WANG Hui-Tao, ZHANG Rui-Kang, WANG Bao-Jun, BIAN Jing, AN Xin, LU Dan, ZHAO Ling-Juan, ZHU Hong-Liang, JI Chen, WANG Wei. Fabrication of 32 Gb/s Electroabsorption Modulated Distributed Feedback Lasers by Selective Area Growth Technology[J]. Chin. Phys. Lett., 2015, 32(5): 054205. DOI: 10.1088/0256-307X/32/5/054205
ZHOU Dai-Bing, WANG Hui-Tao, ZHANG Rui-Kang, WANG Bao-Jun, BIAN Jing, AN Xin, LU Dan, ZHAO Ling-Juan, ZHU Hong-Liang, JI Chen, WANG Wei. Fabrication of 32 Gb/s Electroabsorption Modulated Distributed Feedback Lasers by Selective Area Growth Technology[J]. Chin. Phys. Lett., 2015, 32(5): 054205. DOI: 10.1088/0256-307X/32/5/054205
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ZHOU Dai-Bing, WANG Hui-Tao, ZHANG Rui-Kang, WANG Bao-Jun, BIAN Jing, AN Xin, LU Dan, ZHAO Ling-Juan, ZHU Hong-Liang, JI Chen, WANG Wei. Fabrication of 32 Gb/s Electroabsorption Modulated Distributed Feedback Lasers by Selective Area Growth Technology[J]. Chin. Phys. Lett., 2015, 32(5): 054205. DOI: 10.1088/0256-307X/32/5/054205
ZHOU Dai-Bing, WANG Hui-Tao, ZHANG Rui-Kang, WANG Bao-Jun, BIAN Jing, AN Xin, LU Dan, ZHAO Ling-Juan, ZHU Hong-Liang, JI Chen, WANG Wei. Fabrication of 32 Gb/s Electroabsorption Modulated Distributed Feedback Lasers by Selective Area Growth Technology[J]. Chin. Phys. Lett., 2015, 32(5): 054205. DOI: 10.1088/0256-307X/32/5/054205
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