Optical Constants of SiO₂ Films Deposited on Si Substrates

SiO₂ films were deposited on single-crystalline silicon substrates by ion beam sputtering technology. Optical constants of SiO₂ films are calculated from spectroscopic ellipsometry data, transmittance spectra and reflectance spectra by WVASE32 software, and the best fitted method is obtained for calculating optical constants of dielectric materials in the ultraviolet-visible-infrared (UV-VIS-IR) range. In the UV-VIS-NIR spectral range, refractive indices of SiO₂ films are calculated separately by both ellipsometry data and reflectance spectra, and the obtained results are almost the same. Complex dielectric functions of SiO₂films in the IR spectral range are accurately calculated with infrared transmission spectra using the GenOsc model. The obtained accuracy complex refractive index of SiO₂ films in the wavelength region from 0.19 μm to 25 μm is of great importance for the design of high quality coatings, such as ultra-low loss coating.