Diffraction Properties for 1000 Line/mm Free-Standing Quantum-Dot-Array Diffraction Grating Fabricated by Focused Ion Beam

The traditional fabrication technique of quantum-dot-array diffraction grating (QDADG) is a hybrid lithography method that includes electron-beam lithography and x-ray lithography. In this work, 1000 line/mm free-standing QDADG has successfully been fabricated by focused ion beams (FIBs) for the first time. The diffraction patterns of the grating are measured in the 250–450 nm wavelength range from the xenon lamp source. In consequence, the QDADG in this experiment can be used to disperse light without high-order diffraction. The present inspiriting result demonstrates the prospect of FIB fabrication for high energy QDADG in the soft x-ray region.