Fabrication and Electrical Characteristics of Individual ZnO Submicron-Wire Field-Effect Transistor

Fabrication and electrical characteristics of individual ZnO submicro-wire field-effect transistors (FETs) are investigated by a simple micro-grid template method. The fabricated back-gate ZnO submicro-wire FET is characterized at room temperature in air. The gate voltage V_gs curves reveal gating effect characteristic of n−type conductivity. The field effect mobility of the ZnO submicro-wire is determined to be 7.9 cm²/V·s at V_ds=2 V, the capacitance and transconductance are estimated to be about 3.9 fF and 15.5 nS, respectively. UV sensitive property is measured using a 325-nm laser as the excitation source. Compared to the result carried in darkness, the ZnO submicro-wire FET is sensitive to UV irradiation, which indicates its potential application on UV detectors. Experimental results show that the approach introduced here allows the possibility of fabricating low-cost, reliable and flexible microelectronic devices.