Controllable Ultra Low- k by Via-Typed Air Gap with the Better Design Margin for Logic Devices below 45nm Node
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Abstract
By changing the air gap to a via-typed air gap, the height of the air gap is reduced up to about 50% compared to the height of the trench-typed air gap. The controllable (1≤k <2.9) ultra low-k is also easily fabricated by adjusting the space of the via-typed air gap. The via-typed air gap makes the design margin better due to its lower height in the dense and narrow lines.
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CHOI Youn-Ok, KIM Sang-Yong. Controllable Ultra Low- k by Via-Typed Air Gap with the Better Design Margin for Logic Devices below 45nm Node[J]. Chin. Phys. Lett., 2010, 27(9): 097701. DOI: 10.1088/0256-307X/27/9/097701
CHOI Youn-Ok, KIM Sang-Yong. Controllable Ultra Low- k by Via-Typed Air Gap with the Better Design Margin for Logic Devices below 45nm Node[J]. Chin. Phys. Lett., 2010, 27(9): 097701. DOI: 10.1088/0256-307X/27/9/097701
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CHOI Youn-Ok, KIM Sang-Yong. Controllable Ultra Low- k by Via-Typed Air Gap with the Better Design Margin for Logic Devices below 45nm Node[J]. Chin. Phys. Lett., 2010, 27(9): 097701. DOI: 10.1088/0256-307X/27/9/097701
CHOI Youn-Ok, KIM Sang-Yong. Controllable Ultra Low- k by Via-Typed Air Gap with the Better Design Margin for Logic Devices below 45nm Node[J]. Chin. Phys. Lett., 2010, 27(9): 097701. DOI: 10.1088/0256-307X/27/9/097701
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