Efficient Phase Locking of Fiber Amplifiers Using a Low-Cost and High-Damage-Threshold Phase Control System

  • Received Date: March 31, 2009
  • Published Date: February 28, 2010
  • We propose a low-cost and high-damage-threshold phase control system that employs a piezoelectric ceramic transducer modulator controlled by a stochastic parallel gradient descent algorithm. Efficient phase locking of two fiber amplifiers is demonstrated. Experimental results show that energy encircled in the target pinhole is increased by a factor of 1.76 and the visibility of the fringe pattern is as high as 90% when the system is in close-loop. The phase control system has potential in phase locking of large-number and high-power fiber laser endeavors.
  • Article Text

  • [1] Fan T Y 2005 IEEE J. Sel. Top. Quantum Electron. 11 567
    [2] Goodno G D, Asman C P, Anderegg J, Brosnan S et al 2007 IEEE J. Sel. Top. Quantum Electron. 13 460
    [3] Anderegg J, Brosnan S, Cheung E, Epp P et al 2006 Proc. SPIE 6102 61020U-1
    [4] Shay T M, Benham V, Baker J T, Sanchez A D 2007 IEEE J. Sel. Top. Quantum Electron. 13 480
    [5] Xiao R, Hou J, Liu M, Jiang Z F 2006 Opt. Express 16 2015
    [6] Cheng Y, Liu Y, Xu L X et al 2009 Chin. J. Lasers 36 77
    [7] He B, Lou Q H, Wang W et al 2008 Appl. Phys. Lett. 92 251115
    [8] Peng Q, Zhou Y, Chen Y et al 2005 Electron. Lett. 41
    [9] Li J F, Duan K L, Wang Y S et al 2008 IEEE Photon. Technol. Lett. 20 888
    [10] Jones D C, Stacey C D and Scott A M 2007 Opt. Lett. 32 466
    [11] Yi Y, Shi K, Lu W D and Jian S S 1995 Appl. Opt. 34 7383
    [12] www.shconnet.com.cn
    [13] Liu L and Vorontsov M A 2005 Proc. SPIE 5895 58950P-1
    [14] Kansky J E, Yu C X, Murphy D V, Shaw S E J et al 2006 Proc. SPIE 6306 63060G-1
    [15] Zhou P, Liu Z J, Wang X L, Ma Y X et al 2008 Chin. Phys. Lett. 26 044202
    [16] Zhou P, Liu Z J, Wang X L, Ma Y X et al 2009 IEEE J. Sel. Top. Quantum Electron. 15 248
    [17] Vorontsov M A and Carhart G W 2007 Opt. Lett. 22 907
    [18] Vorontsov M A and Carhart G W 2000 J. Opt. Soc. Am. A 17 1440
  • Related Articles

    [1]HU Wen-Juan, XIE Fen-Yan, CHEN Qiang, WENG Jing. Polyethylene Oxide Films Polymerized by Radio Frequency Plasma-Enhanced Chemical Vapour Phase Deposition and Its Adsorption Behaviour of Platelet-Rich Plasma [J]. Chin. Phys. Lett., 2008, 25(10): 3805-3807.
    [2]HAO Xiao-Peng, WANG Bao-Yi, YU Run-Sheng, WEI Long, WANG Hui, ZHAO De-Gang, HAO Wei-Chang. Evolution of Structural Defects in SiOx Films Fabricated by Electron Cyclotron Resonance Plasma Chemical Vapour Deposition upon Annealing Treatment [J]. Chin. Phys. Lett., 2008, 25(3): 1034-1037.
    [3]LIN Ying-Bin, YANG Yan-Min, XU Jian-Ping, LIU Xing-Chong, WANGJian-Feng, HUANG Zhi-Gao, ZHANG Feng-Ming, DU You-Wei. Photoluminescence of ZnO and Mn-Doped ZnO Polycrystalline Films Prepared by Plasma Enhanced Chemical Vapour Deposition [J]. Chin. Phys. Lett., 2007, 24(9): 2685-2688.
    [4]LIN Ying-Bin, LU Zhi-Hai, ZOU Wen-Qin, LU Zhong-Lin, XU Jian-Ping, JI Jian-Ti, LIU Xing-Chong, WANG Jian-Feng, LV Li-Ya, ZHANG Feng-Ming, DU You-Wei, HUANG Zhi-Gao, ZHENG Jian-Guo. Room-Temperature Ferromagnetic ZnMnO Thin Films Synthesized by Plasma Enhanced Chemical Vapour Deposition Method [J]. Chin. Phys. Lett., 2007, 24(7): 2085-2087.
    [5]Department of Physics, Lanzhou University, Lanzhou. Al-Induced Crystallization Growth of Si Films by Inductively Coupled Plasma Chemical Vapour Deposition [J]. Chin. Phys. Lett., 2006, 23(12): 3338-3340.
    [6]YU Wei, WANG Bao-Zhu, LU Wan-Bing, YANG Yan-Bin, HAN Li, FU Guang-Sheng. Growth of Nanocrystalline Silicon Films by Helicon Wave Plasma Chemical Vapour Deposition [J]. Chin. Phys. Lett., 2004, 21(7): 1320-1322.
    [7]LIN Xuan-Ying, HUANG Chuang-Jun, LIN Kui-Xun, YU Yun-Peng, YU Chu-Ying, CHI Ling-Fei. Low-Temperature Growth of Polycrystalline Silicon Films bySiCl4/H2 rf Plasma Enhanced Chemical Vapor Deposition [J]. Chin. Phys. Lett., 2003, 20(10): 1879-1882.
    [8]WANG Peng-Fei, DING Shi-Jin, ZHANG Wei, ZHANG Jim-Yun, WANG Ji-Tao, WEI William Lee. FTIR Characterization of Fluorine Doped Silicon Dioxide Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition [J]. Chin. Phys. Lett., 2000, 17(12): 912-914.
    [9]LIU Yi-chun, LIU Chun-guang, CHEN Da-wei, LIU Yu-xue, BAI Yu-bai, LI Tie-jin. Photoluminescence Properties of a-SiC:H Films Grown by Plasma Enhanced Chemical Vapor Deposition from SiH4+C2H2 Gas Mixtures [J]. Chin. Phys. Lett., 1998, 15(11): 837-839.
    [10]MA Tian-fu, CHEN Kun-ji, DU Jia-fang, XU Jun, LI Wei, HUANG Xin-fan. Blue Light Emission from Hydrogenated Amorphous Silicon CarbidePrepared by Xylene Source in Plasma-Enhanced Chemical Vapour Deposition System [J]. Chin. Phys. Lett., 1996, 13(12): 947-949.

Catalog

    Article views (1) PDF downloads (588) Cited by()

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return