Properties of Al_yGa_1-yN/Al_xGa_1-xN/AlN/GaN Double-Barrier High Electron Mobility Transistor Structure

Electrical properties of Al_yGa_1-yN/Al_xGa_1-xN/AlN/GaN structure are investigated by solving coupled Schrödinger and Poisson equation self-consistently. Our calculations show that the two-dimensional electron gas (2DEG) density will decrease with the thickness of the second barrier (Al_yGa_1-yN) once the AlN content of the second barrier is smaller than a critical value y_c, and will increase with the thickness of the second barrier (Al_yGa_1-yN) when the critical AlN content of the second barrier y_c is exceeded. Our calculations also show that the critical AlN content of the second barrier y_c will increase with the AlN content and the thickness of the first barrier layer (Al_xGa_1-xN).