DEEP TRAPS IN a-Si:H MEASURED BY INFRARED STIMULATED CURRENT
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Abstract
Silicon dangling bond(DB) is widely accepted as recombination center in a-Si:H. This is true at room temperature. We measured the Infrared Stimulated Current(IRSC) in the temperature range of 86-260K. and focused on the PC onset overshoot for both undoped and P-doped samples. The results show that DB also acts as electron trap, especially at low temperature.
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LI Wei, HAN Daxing. DEEP TRAPS IN a-Si:H MEASURED BY INFRARED STIMULATED CURRENT[J]. Chin. Phys. Lett., 1988, 5(9): 393-396.
LI Wei, HAN Daxing. DEEP TRAPS IN a-Si:H MEASURED BY INFRARED STIMULATED CURRENT[J]. Chin. Phys. Lett., 1988, 5(9): 393-396.
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LI Wei, HAN Daxing. DEEP TRAPS IN a-Si:H MEASURED BY INFRARED STIMULATED CURRENT[J]. Chin. Phys. Lett., 1988, 5(9): 393-396.
LI Wei, HAN Daxing. DEEP TRAPS IN a-Si:H MEASURED BY INFRARED STIMULATED CURRENT[J]. Chin. Phys. Lett., 1988, 5(9): 393-396.
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