High Spectral Resolution Mo/Si Multilayers Working at High Order Reflection
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WU Wen-Juan,
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ZHU Jing-Tao,
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WANG Zhan-Shan,
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ZHANG Zhong,
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WANG Feng-Li,
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WANG Hong-Chang,
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ZHANG Shu-Min,
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XU Yao,
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CHENG Xin-Bin,
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WANG Bei,
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LI Cun-Xia,
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WU Yong-Rong,
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QIN Shu-Ji,
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CHEN Ling-Yan,
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ZHOU Hong-Jun,
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HUO Tong-Lin
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Abstract
The high reflectance orders are used to improve the spectral resolution of Mo/Si multilayers. The multilayers for the first-, second- and third-order reflectance are designed and optimized, respectively. These multilayers are fabricated by using a directed current magnetron sputtering system, and the reflectivity is measured in an extreme ultraviolet range by synchrotron radiation. The experimental results show that the spectral resolution λ/Δλ (λ=14nm) increases from 24.6 for the first order to 66.6 for the third order.
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