High Spectral Resolution Mo/Si Multilayers Working at High Order Reflection
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Abstract
The high reflectance orders are used to improve the spectral resolution of Mo/Si multilayers. The multilayers for the first-, second- and third-order reflectance are designed and optimized, respectively. These multilayers are fabricated by using a directed current magnetron sputtering system, and the reflectivity is measured in an extreme ultraviolet range by synchrotron radiation. The experimental results show that the spectral resolution λ/Δλ (λ=14nm) increases from 24.6 for the first order to 66.6 for the third order.
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References
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