High-Power-Density Plasma Deposition of Diamond-LikeCarbons Films

We present a new method utilizing a high-power-density plasma for depositing diamond-like carbon (DLC) films. The main advantage of this technique is the possibility that films with good adhesion to the substrate can be prepared under room temperature and low pressure. The DLC films are deposited on the silicon substrate successfully. The structure of the DLC films was characterized by high energy electron diffraction, scanning electron microscopy, Raman spectroscopy, x-ray photoelectron spectroscopy, and infrared absorption spectrum.