Optical Erasure Characteristics of Holograms in Batch Thermal-Fixing
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Abstract
The optical erasure dynamics in a batch-thermal fixing scheme of holographic storage in photorefractive crystals is investigated theoretically and experimentally. The inter-batch optical erasure time constant τF is introduced to specify the optical erasure to compensated gratings, and measured in a sophisticated experiment. The experimental result shows that τF is much longer than the intra-batch optical erasure time constant τE. The difference between τF and τE is fundamental for enhancing nonvolatile storage density.
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JIANG Zhu-Qing, TAO Shi-Quan, YUAN Wei, LIU Guo-Qing, WANG Da-Yong. Optical Erasure Characteristics of Holograms in Batch Thermal-Fixing[J]. Chin. Phys. Lett., 2006, 23(10): 2749-2752.
JIANG Zhu-Qing, TAO Shi-Quan, YUAN Wei, LIU Guo-Qing, WANG Da-Yong. Optical Erasure Characteristics of Holograms in Batch Thermal-Fixing[J]. Chin. Phys. Lett., 2006, 23(10): 2749-2752.
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JIANG Zhu-Qing, TAO Shi-Quan, YUAN Wei, LIU Guo-Qing, WANG Da-Yong. Optical Erasure Characteristics of Holograms in Batch Thermal-Fixing[J]. Chin. Phys. Lett., 2006, 23(10): 2749-2752.
JIANG Zhu-Qing, TAO Shi-Quan, YUAN Wei, LIU Guo-Qing, WANG Da-Yong. Optical Erasure Characteristics of Holograms in Batch Thermal-Fixing[J]. Chin. Phys. Lett., 2006, 23(10): 2749-2752.
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