Growth of Diamond Films by Microwave Plasma Chemical Vapor Deposition
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Abstract
Diamond thin films were produced by microwave plasma chemical vapor deposition. The deposit is identified by X-ray diffraction, Raman spectroscopy and Scanning electron microscopy. During the course of diamond growth, the characteristics of the plasma have been measured by means of the Langmuir double probe and emission spectrometer.
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GAO Kelin, WANG Chunlin, ZHAN Rujuan, PENG Dingkun, MENG Giangyao, XIANG Zhilin. Growth of Diamond Films by Microwave Plasma Chemical Vapor Deposition[J]. Chin. Phys. Lett., 1991, 8(7): 348-351.
GAO Kelin, WANG Chunlin, ZHAN Rujuan, PENG Dingkun, MENG Giangyao, XIANG Zhilin. Growth of Diamond Films by Microwave Plasma Chemical Vapor Deposition[J]. Chin. Phys. Lett., 1991, 8(7): 348-351.
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GAO Kelin, WANG Chunlin, ZHAN Rujuan, PENG Dingkun, MENG Giangyao, XIANG Zhilin. Growth of Diamond Films by Microwave Plasma Chemical Vapor Deposition[J]. Chin. Phys. Lett., 1991, 8(7): 348-351.
GAO Kelin, WANG Chunlin, ZHAN Rujuan, PENG Dingkun, MENG Giangyao, XIANG Zhilin. Growth of Diamond Films by Microwave Plasma Chemical Vapor Deposition[J]. Chin. Phys. Lett., 1991, 8(7): 348-351.
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