Photorefractive Properties of Paraelectric Copper Doped Potassium Tantalate Niobate
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Abstract
The photorefractive properties of Cu doped KTa1-x NbxO3 have been studied by using two-wave mixing method. The diffraction efficiency reaches as high as 52% under an electric field. The dependences of diffraction efficiency on interference angles and applied fields have been studied. The maximum light induced index change is found to be 2.33 x10-5 and the photorefraction sensitivity calculated is 5 x 10-6cm2/J. Experimental results demonstrate that electrons are the dominant charge carriers.
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References
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