Microwave Absorption in Electron Cyclotron Resonance Plasma

The microwave power absorption in electron cyclotron resonance plasma reactor was investigated with a two-dimensional hybrid-code. Simulation results indicated that there are two typical power deposition profiles over the entire parameter region: (1) microwave power deposition peaks on the axis and decreases in radial direction, (2) microwave power deposition has its maximum at some radial position, i.e., a hollow distribution. The spatial distribution of electron temperature resembles always to the microwave power absorption profile. The dependence of plasma parameter on the gas pressure is discussed also.