Field-Biased Diffusion-Limited Aggregation in Electrochemical Deposition System
-
Abstract
We extend the diffusion-limited aggregation model of Witten and Sander to the electrochemical deposition system by considering the effects of the external electric field. A jump probability for field-biased-diffusion is reasonably deduced, which enables us to obtain a series of loopless random fractals with varying fractal dimensions.
Article Text
-
-
-
About This Article
Cite this article:
PENG Gongwen, TIAN Decheng. Field-Biased Diffusion-Limited Aggregation in Electrochemical Deposition System[J]. Chin. Phys. Lett., 1992, 9(7): 359-362.
PENG Gongwen, TIAN Decheng. Field-Biased Diffusion-Limited Aggregation in Electrochemical Deposition System[J]. Chin. Phys. Lett., 1992, 9(7): 359-362.
|
PENG Gongwen, TIAN Decheng. Field-Biased Diffusion-Limited Aggregation in Electrochemical Deposition System[J]. Chin. Phys. Lett., 1992, 9(7): 359-362.
PENG Gongwen, TIAN Decheng. Field-Biased Diffusion-Limited Aggregation in Electrochemical Deposition System[J]. Chin. Phys. Lett., 1992, 9(7): 359-362.
|