EELS INVESTIGATION ON RS a-SixC1-x: H ALLOY FILM

    Abstract
  • EELS Technique is used to analyze the amorphous silicon-carbon-hydrogen alloy film deposited by RF sputtering method (RS a-SixC1-x: H). It is further verified that a structural change occurs at 1-x ≥ 0.40 in the alloy film.
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