Instability Parameters of Optical Oscillation Frequency in Plasma Central Discharge and Periphery Region
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Abstract
We have observed relaxation oscillations in a capacitive discharge in Ar gas, connected to a peripheral ground chamber. The plasma oscillations observed from time-varying optical emission from the main discharge chamber show, for example, a high frequency (75.37kHz) relaxation oscillation, at 100mTorr and 8W absorbed power, and a low frequency (2.72Hz) relaxation oscillation, 100mTorr and 325W absorbed power. Time-varying optical emission intensity and plasma density are also detected with a Langmuir probe. The theoretical result agrees well with experiments.
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ZHOU Zhu-Wen, M. A. LIEBERMAN, Sungjin KIM. Instability Parameters of Optical Oscillation Frequency in Plasma Central Discharge and Periphery Region[J]. Chin. Phys. Lett., 2006, 23(8): 2251-2254.
ZHOU Zhu-Wen, M. A. LIEBERMAN, Sungjin KIM. Instability Parameters of Optical Oscillation Frequency in Plasma Central Discharge and Periphery Region[J]. Chin. Phys. Lett., 2006, 23(8): 2251-2254.
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ZHOU Zhu-Wen, M. A. LIEBERMAN, Sungjin KIM. Instability Parameters of Optical Oscillation Frequency in Plasma Central Discharge and Periphery Region[J]. Chin. Phys. Lett., 2006, 23(8): 2251-2254.
ZHOU Zhu-Wen, M. A. LIEBERMAN, Sungjin KIM. Instability Parameters of Optical Oscillation Frequency in Plasma Central Discharge and Periphery Region[J]. Chin. Phys. Lett., 2006, 23(8): 2251-2254.
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