Hole-Doped Nonvolatile and Electrically Controllable Magnetism in van der Waals Ferroelectric Heterostructures
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Abstract
Electrical control of magnetism in van der Waals semiconductors is a promising step towards development of two-dimensional spintronic devices with ultralow power consumption for processing and storing information. Here, we propose a design for two-dimensional van der Waals heterostructures (vdWHs) that can host ferroelectricity and ferromagnetism simultaneously under hole doping. By contacting an InSe monolayer and forming an InSe/In2Se3 vdWH, the switchable built-in electric field from the reversible out-of-plane polarization enables robust control of the band alignment. Furthermore, switching between the two ferroelectric states (P↑ and P↓) of hole-doped In2Se3 with an external electric field can interchange the ON and OFF states of the nonvolatile magnetism. More interestingly, doping concentration and strain can effectively tune the magnetic moment and polarization energy. Therefore, this provides a platform for realizing multiferroics in ferroelectric heterostructures, showing great potential for use in nonvolatile memories and ferroelectric field-effect transistors. -
Since the experimental preparation of intrinsic two-dimensional (2D) magnetic materials, such as Cr2Ge2Te6,[1] CrI3,[2] Fe3GeTe2,[3] and VSe2,[4] tuning ferromagnetism (FM) in 2D systems by an electric field has been an intriguing long-term goal in materials research[5–8] that still faces enormous challenges. For example, electric modulation of magnetic properties usually requires an ultra-strong electric field which is hardly met by the usual gate electrodes. One promising method is dielectric gating, which could achieve such a field but may affect the structure.[9,10] With this method, carrier densities of 1015cm−2 can be achieved in 2D materials.[11,12] Another issue is that electrically tuned magnetism is volatile (maintaining the magnetic state requires continuous power, resulting in high energy costs) and/or irreversible (non-tunable). Therefore, it would be desirable to obtain nonvolatile electric-field-dependent magnetism in nonmagnetic (NM) materials.
On the other hand, ferroelectric (FE) materials with tunable broken inversion symmetry always exhibit a strong size effect, and the depolarization field provided by the surface charges is opposite to the internal polarization and will try to compensate the internal polarization.[13–15] In particular, the polarization may disappear when the film thickness is very small, such as in BaTiO3 and PbTiO3. Therefore, as the dimensionality decreases to the nanoscale, the depolarization field becomes extremely strong and may cancel the polarization.[16] Surprisingly, a series of atomically thin 2D FE materials, such as SnTe,[17] CuInP2S6,[18] Sc2CO2,[19] and In2Se3,[20] have recently been discovered through calculations and experiments.[21,22] Due to their nanoscale size, 2D FE materials with switchable electrical polarization are suitable for next-generation data storage. In particular, FE In2Se3 exhibits out-of-plane and in-plane polarizations, conducive to practical device applications in high-density integration.[23] Compared with other storage devices (e.g., FM memories), the nonvolatility of FE memory is advantageous for realizing long-term data preservation. Furthermore, to simultaneously enhance the data reliability and reduce disturbance of the reading operation, we would expect to separate the operations of writing and reading using multiferroic materials, for example, writing with an electric field and reading with a magnetic probe in an FE–FM material.
Besides some chance discoveries,[24–27] single-phase 2D multiferroic materials with both FE and FM orders promise the control of disparate properties. However, they remain rarely reported because multiferroic materials are challenged by the contradictory preferences of different kinds of ferroic materials for metal ion d-orbitals, i.e., FE requires empty d-orbitals but FM usually comes from partially filled d-orbitals.[28] Fortunately, different 2D flakes can stack into van der Waals heterostructures (vdWHs) because 2D materials have no surface dangling bonds and can be precisely stacked without leading to lattice mismatch. Therefore, using 2D FE materials in a vdWH provides an additional degree of freedom to control magnetism by flipping the polarization direction,[29] i.e., one can electrically control the magnetism in an FE–FM coupled heterostructure, which is promising for extending applications in data storage devices. Recently, several studies have revealed that hole doping can cause magnetism in some 2D systems due to their inherent Mexican-hat-like band dispersion.[30–34] The Mexican-hat-like dispersion provides a sharp van Hove singularity (VHS) near the Fermi level (EF) on the density of states (DOS), leading to significant exchange splitting of the electronic states of the two spin channels under proper hole doping and resulting in a net magnetic moment and spontaneous polarization.[35] Therefore, modulating FE states to control FM states in 2D vdWHs is promising for designs of nonvolatile memory devices.
In this Letter, we propose a design for realizing 2D multiferroics (coexistence of FE and FM) in FE heterostructures comprising only d0 semiconductors. We choose 2D InSe and FE In2Se3 monolayers to describe the principles, forming an InSe/In2Se3 vdWH in which both monolayers can almost hold the same band structures as those of the isolated individuals, respectively, and the band edge alignment couples directly to the polarization state. As the polarization is towards the InSe layer, the Mexican-hat-like band dispersion of the In2Se3 aligns on the top of the valence band (VB). Hence, under proper hole doping it evokes considerable magnetic polarization energy. In contrast, the reversed polarization pushes the VB maximum (VBM) of the InSe over the In2Se3 VB as the global edge of VBs. Therefore, much heavier doping is needed to evoke spin polarization with a rather tiny magnetic polarization energy. Therefore, with the FE reversion, the magnetic state bears an ON and OFF switch, which is promising for data storage devices.
Computational Methods. All calculations were performed by the spin-polarized density functional theory (DFT) method as implemented in the Vienna ab initio simulation package (VASP),[36] and the Perdew–Burke–Ernzerhof (PBE) functional was used in the generalized gradient approximation (GGA)[37] scheme. The k-point samples and energy cutoff for structural optimization were set to be 15 × 15 × 1 and 500 eV, respectively. The vdW interaction between layers was described by the DFT-D3 method.[38] Dipole correction was employed due to the asymmetric layer arrangement.[39] Phonon dispersions were calculated with density functional perturbation theory using the PHONOPY code.[40] Hole doping was simulated by removing electrons in a system with a compensated uniform negative background.
Results and Discussion. To realize memory devices with high speed and low energy consumption we propose a design of nonvolatile and switchable magnetic states based on 2D multiferroic vdWHs. These vdWHs should meet the following stringent conditions: (i) one of the materials is an FE material; (ii) the band alignment is tuned during polarization flipping; and (iii) one of the materials has a rather sharp DOS, for example, a VHS that can be easily realized by a Mexican-hat-like band dispersion, near the EF. Guided by these strategies, we propose an InSe/In2Se3 FE vdWH as an example to demonstrate the feasibility of this design. Notably, d or f electrons are not necessary for this proposal.
We chose the experimentally accessible In2Se3 and InSe monolayers,[41,42] as shown in Figs. 1(a) and 1(b), as the FE and auxiliary layers, respectively, forming a vdWH as shown in Fig. S1 and Table S1 in the Supplementary Material.[43] The 2D FE In2Se3 contains five atomic sublayers in the Se–In–Se–In–Se order. The central Se atomic sublayer deviates from the middle position between the top and bottom Se atomic layers, resulting in out-of-plane polarization. Besides the FE property of In2Se3, it possesses a narrow VB with Mexican-hat-like band dispersion. InSe is chosen because of its semiconductor property and proper hexagonal lattice (i.e., its lattice parameters are similar to those of In2Se3). Although the lattice mismatch plays a trivial role in the vdWH, matched lattices can save on calculation expenses. InSe and In2Se3 are indirect bandgap semiconductors with bandgaps of 1.53 and 0.81 eV, respectively, as shown in Figs. 2(a) and 2(b), consistent with the previous results.[21,44] The polarization state is marked as P↑ and P↓ when the central Se atom shifts close to the bottom and top layers, respectively. The polarization plays the role of a ‘handle’ that can modulate the electronic characteristics of the vdWH. Compared with the symmetrical InSe monolayer, the electrostatic potentials on both sides of FE In2Se3 are noticeably different, as shown in Fig. 2(c), leading to an electrostatic potential difference of 1.179 eV. In the vdWH, the InSe layer interacts with the P↑ or P↓ states of the In2Se3 layer, as depicted in Figs. 1(c) and 1(d), resulting in different band alignments. Given their relative positions, the two different polarization states (P↑ or P↓) are equal to the two cases in which the InSe layer contacts the In2Se3 layer from different sides. In addition, no imaginary mode occurs on the phonon spectra of the vdWH, illustrating good structural stability as shown in Fig. S2.[43] The band structures are shown in Figs. 3(a) and 3(b). The VBM and conduction band minimum (CBM) vary slightly compared with the isolated InSe and In2Se3 monolayers, as shown in Fig. 2(d), due to the weak interlayer interaction.
Fig. 1. Top (upper) and side (lower) views of (a) InSe and (b) In2Se3 monolayers. The magenta and green beads represent In and Se atoms, respectively. The orange dashed rhombi mark the unit cells. The two polarization states of InSe/In2Se3 vdWHs are shown in (c) and (d), respectively. The red double-headed arrows mark the interlayer distances, d.Fig. 3. Projected band structures for neutral (a) InSe/In2Se3 (P↓) and (b) InSe/In2Se3 (P↑). Doping concentration dependence of the magnetic moment for (c) InSe/In2Se3 (P↓) and (d) InSe/In2Se3 (P↑). The light blue region indicates large spin polarization energies. The inset of (c) is the spin density distribution in the FM state of InSe/In2Se3 (P↓) at a hole density of 9.75 × 1014 cm−2. (e) Spin-polarized band structure and (f) spin-polarized partial density of states (PDOS) of InSe/In2Se3 (P↓) vdWH for a hole density of 9.75 × 1014 cm−2. Blue (red) and cyan (orange) lines represent the contributions of the InSe (In2Se3) layer with the spin-up and spin-down bands, respectively. The inset of (e) is the differential charge density before and after the hole doping of InSe/In2Se3 (P↓). The EF is set to be zero and marked with a black dashed line.To further analyze the change in electronic properties, we plot the projected band structures of the InSe/In2Se3 vdWHs, as shown in Figs. 3(a) and 3(b). Although the bandgaps of InSe/In2Se3 vdWHs are slightly different in the two polarization directions, i.e., the bandgaps for InSe/In2Se3 (P↓) and InSe/In2Se3 (P↑) are 0.48 and 0.45 eV, respectively, the band alignments are distinctly different. For the InSe/In2Se3 (P↓) vdWH, the CBM and VBM are contributed by the InSe and In2Se3 layers, respectively. Conversely, by reversing the polarization of In2Se3 (to P↑), the band edge of the In2Se3 layer shifts downward, resulting in the VBM of the InSe layer being closer to EF. Therefore, according to the design principles, flipping the polarization of the FE layer can switch band alignment.
Because the VBMs of both monolayers possess Mexican-hat-like dispersion, there is a one-dimensional-like VHS at the VB edge on the DOS spectrum. Therefore, as proper hole doping shifts EF to the VHS, spin degeneracy will be lifted due to electronic interaction, similar to the previous report on GaSe.[35] Therefore, we calculated the two FE polarization cases for the vdWH. The relevant results for InSe and In2Se3 monolayers are shown in Fig. S3.[43] This displays the dependence of magnetic moment and magnetization energy on the number of doped holes, where one hole per unit cell corresponds to a doping concentration of approximately 7 × 1014 cm−2. For the InSe/In2Se3 (P↓) case, the In2Se3 layer dominates the VBM. Quite light doping could drive the system to spin polarization with tremendous magnetic polarization energy (Ep), defined as the energy difference between the FM and NM states, as depicted in Fig. 3(c), as in our previous report on a In2Se3 monolayer.[45] Figure 3(c) shows that the magnetic moment suddenly emerges at a concentration of about 4.53 × 1014 cm−2 and increases continuously as the hole doping level enhances gradually then rapidly saturates at about 0.5 μB/hole, indicating magnetization of the vdWH. As shown in the inset of Fig. 3(c), the spin density is rather delocalized and is mainly distributed around all top layer Se atoms of In2Se3, so the magnetic moment comes from itinerant holes due to the homogeneous distribution in the top Se sublayer of In2Se3. The large DOS at Fermi energy level indicates FM instability according to the Stoner criterion, and this itinerant magnetism can persist over a sizable range of doping concentrations. Ep becomes more negative as doping increases, indicating more robust spin polarization and magnetic stability. Noticeably, Ep remains more negative than −26 meV from the doping concentration of 9.75 × 1014 to 1.39 × 1015 cm−2, implying big spin polarization of the InSe/In2Se3 vdWH. However, the InSe layer makes a major contribution to the VBM for the InSe/In2Se3 (P↑) case. Under hole doping, the system can be spin-polarized but with trivial Ep, indicating an NM nature, as shown in Fig. 3(d), similarly with doping in GaSe. Consequently, as the FE polarization determines the manner of band alignment dominating the electronic structure and then determines the spin polarization, we can tune the FE polarization with an external electric field to modulate the electricity and magnetism in the vdWH.
Moreover, we project the spin-polarized energy bands to the two layers, in the P↓ case at a hole density of 9.75 × 1014 cm−2, as shown in Fig. 3(e). The spin degeneracy of the energy band from the In2Se3 layer is lifted with a large exchange splitting of about 0.28 eV. As a result, the spin-up band (red line) is fully occupied and lies about 0.2 eV below EF, while the spin-down band (orange line) intersected by EF lies much higher. In contrast, the bands originating from the InSe layer are still degenerate. Since the VBs (blue and cyan lines) of the InSe layer are very dispersive, there is no exchange splitting of the holes residing on the InSe layer. As shown in the inset of Fig. 3(e), the holes are mainly doped on Se1 and Se5 atoms. Therefore, half of the holes gather in the InSe layer and the other half reside in the In2Se3 layer. Thus, the total magnetic moment saturates at about 0.5 μB/hole. According to our test calculations for the noncollinear magnetic moments, the magnetically easy axis is in the out-of-plane direction with a magnetic anisotropic energy of 0.2 meV. By considering the unit cell magnetic moment as an integral (this is a coarse approximation), we could examine the parallel and antiparallel magnetic configurations in a 2 × 2 supercell and find that the parallel configuration is about 99.6 meV more favorable than the antiparallel one. Based on the Heisenberg model, we could make a rough estimation of the nearest-neighbor exchange integral to be J = 24.91 meV and the Curie temperature to be TC ∼ 84 K, by means of classic Monte Carlo simulations, as stated in Note III and Fig. S4 in the Supplementary Material.[43]
We have also plotted the band structure and DOS for InSe/In2Se3 (P↑) at the same hole density for comparison between P↑ and P↓. As shown in Fig. S5,[43] there is no spin splitting in InSe/In2Se3 (P↑). The semiconductor InSe auxiliary layer in this tunable multiferroic vdWH contributes to the global VBM on the P↑ state of the In2Se3 layer, making the system NM (OFF) under light hole doping. Although it becomes spin polarized under heavier doping, Ep is too small to hold the magnetism. Therefore, the InSe/In2Se3 (P↑) case is NM over the entire doping range. Hence, with the semiconductor InSe, nonvolatile and switchable magnetism under hole doping can be coded by setting the FE state of the In2Se3 layer. Emphatically, the magnetic state switches from ON to OFF when the polarization direction of In2Se3 alters from P↓ to P↑. Both states are robust even if the external electric field is removed, which benefits information nonvolatility and a reduction in energy consumption. Experimentally, the switchable behavior has been successfully realized in the 2D polar material WTe2.[46] Moreover, as shown in Fig. 4, based on the nudged elastic band calculation of migration paths, the energy barriers between P↑ and P↓ states could be decreased upon hole doping, which benefits FE phase transition. As the doping concentration reaches 1.4 holes/u.c., the magnetic moment of the system reaches saturation. At this point, the value of the energy barrier is 0.064 eV, which ensures that the higher-energy electrically polarized state is stable compared with the lower-energy electrically polarized state. Additionally, we have computed the polar atomic displacements in the InSe/In2Se3 vdWH (P↓) as a function of charge-carrier concentration obtained via the background charge method. Figure S6 suggests that the polar phase can support a substantial number of charged defects while maintaining the polar structure. Therefore, we believe that the external electric field can accurately control the spin states by flipping the FE polarization of In2Se3 in the vdWH. The above analyses show that the magnetism-switching behavior of InSe/In2Se3 vdWH comes from two aspects: (i) the coupling at the InSe/In2Se3 vdWH interface renders different band alignments under different polarization states, and (ii) the Mexican-hat-like band edge dispersion can realize magnetism under hole doping. These two aspects are not exclusive to the InSe/In2Se3 vdWH. Therefore, modulating ON–OFF switchable and nonvolatile magnetism under hole doping by interface engineering may also be extended to other heterostructures. Additionally, implementing nonvolatile magnetic switching via an FE switch relies on two common features of FE materials, namely the FE bistable state and broken spatial-inversion symmetry, which shows that engineering semiconductor-aided multiferroic heterostructures is a general strategy for realizing nonvolatile magnetic switching.
Usually, magnetic properties are strain sensitive. So, we examine the effect of biaxial strain on the doping-induced magnetization of the InSe/In2Se3 (P↓) vdWH. We simulate the biaxial strain by changing the lattice constant, and the strain is defined as ε = (a – a0)/a0, where a (a0) is the lattice constant of the strained (unstrained) InSe/In2Se3 (P↓) vdWH. We calculate the magnetic moment and Ep for various strains. The magnetic moment and Ep are strongly strain-dependent in magnetic transition, as shown in Figs. 5(a) and 5(b). The magnetism can be turned on at a lower doping concentration under tensile strain, i.e., the tensile strain can lose the constraint of the doping concentration to achieve magnetism. We calculate the biaxial-strain-dependent magnetic moment at three doping levels, 4.9 × 1014 cm−2 (red), 7.0 × 1014 cm−2 (blue) and 9.8 × 1014 cm−2 (green), respectively, as presented in Fig. 5(c). The doping-induced magnetization is suppressed under compressive strain when the doping level is relatively low (4.9 × 1014 cm−2). Conversely, its magnetic moment rapidly increases to saturation under tensile strain. At a doping concentration of 9.8 × 1014 cm−2, the magnetic moment retains saturation under stronger strains.
Fig. 5. (a) Magnetic moment and (b) polarization energy under different strains. (c) Strain dependence of the hole doping magnetic moment at different concentrations. (d) Band structures of InSe/In2Se3 (P↓) vdWH under 4% tensile strain, no strain and 2% compressive strain, respectively. The radius of the Mexican-hat band edge (kr) is indicated by black double-headed arrows.To reveal the underlying mechanisms of the strain-induced variation in magnetism, we plot the band structures of InSe/In2Se3 (P↓) vdWH under different strains, as shown in Fig. 5(d). Compared with the pristine one (cyan line) in Fig. 5(d), the radius of the Mexican-hat band edge (kr) becomes larger under tensile strain (blue line). The band edge circle will extend in the Brillouin zone, enhancing and sharpening the DOS peak and increasing hole accommodation near EF. As a result, a sharper DOS peak means that the Stoner criterion is more easily fulfilled under hole doping. In contrast, kr becomes smaller when a compressive strain is applied (red line), thus weakening the magnetism. Because the orbital overlaps less (more) after the extension (compression), the VB becomes flatter (more dispersive) and easily (hardly) fulfills the Stoner criterion. In addition, the tensile strain also raises the energy band near the K point, which leads to a sharper and higher DOS peak close to the Fermi level. This explains why the onset of magnetism occurs at a lower hole doping concentration under tensile strain, as shown in Fig. 5(a). Conversely, under compressive strain, the appearance of magnetism requires a higher hole doping concentration. Therefore, mechanical modulation can strongly affect magnetism in the InSe/In2Se3 vdWH.
Furthermore, we propose a data storage device, as illustrated in Fig. 6, for nonvolatile magnetic switching applications based on this InSe/In2Se3 FE vdWH, with a 2D insulator such as hexagonal boron nitride (h-BN) as the substrate. Since the vdWH is made of atomically thin layered materials, the doping levels of our device could be electrostatically tuned by a gate. The properties of the InSe/In2Se3 vdWH, in either the FM or NM state under hole doping, are controlled by the polarization state (P↓ or P↑) of the In2Se3. As mentioned above, the data writing operation is performed by coding the FE polarization, similar to the case in an In2Se3-only device. In addition, to illustrate the influence of the substrate on the properties of the system, we also calculated the partial density of states of the InSe/In2Se3 (P↓) vdWH on a single-layer h-BN substrate, as shown in the inset in Fig. 6. Remarkably, the effect of the h-BN substrate on the inherent characteristics of the InSe/In2Se3 (P↓) vdWH is negligible. The In2Se3 layer accounts for the dominant proportion (red) in the VB peaks compared with those of the InSe (blue) and BN (magenta) layers, so the magnetic switching character can also be achieved with the BN substrate, and the magnetic moment does not substantially change. Therefore, an InSe/In2Se3-based data storage device can be prepared on an h-BN substrate with proper hole doping. The data reading process can be performed by checking the magnetoelectric signal differences from the damage-free current.[47] Such a strategy is ideal for nano-spintronic devices with nonvolatility and low energy consumption.
Fig. 6. Dependence of the magnetic moment of the h-BN/InSe/In2Se3 (P↓) vdWH on doping concentration. Bottom inset: concept and sketch diagram of the data storage device based on the h-BN/InSe/In2Se3 vdWH. Upper right inset: partial density of states (PDOS) of the h-BN/InSe/In2Se3 (P↓) vdWH. The light blue regions indicate large spin polarization energies.In summary, an intriguing strategy is proposed to introduce a semiconductor auxiliary to an FE layer to control the magnetic state. Interestingly, hole-doped InSe/In2Se3 transits from NM to FM when the polarization direction is flipped. Therefore, this approach is general for securing and engineering new material systems for nonvolatile data storage applications.
Acknowledgments: The authors are grateful to Professor Xiaohui Liu in Shandong University for constructive discussion. This work was supported by the Natural Science Foundation of Shandong Province (Grant Nos. ZR2020MA068, ZR2022MA083, and ZR2023MA018), and the Major Basic Research Project of Shandong Province (Grant No. ZR2020ZD28). The authors acknowledge technical support from the Micro-modular Data Platform of the School of Physics at Shandong University. -
References
[1] Gong C, Li L, Li Z L, et al. 2017 Nature 546:265 doi: 10.1038/nature22060[2] Huang B, Clark G, Navarro-Moratalla E, et al. 2017 Nature 546:270 doi: 10.1038/nature22391[3] Deng Y J, Yu Y J, Song Y C, et al. 2018 Nature 563:94 doi: 10.1038/s41586-018-0626-9[4] Yu W, Li J, Herng T S, et al. 2019 Adv. Mater. 31:1903779 doi: 10.1002/adma.201903779[5] Wolf S A, Awschalom D D, Buhrman R A, et al. 2001 Science 294:1488 doi: 10.1126/science.1065389[6] Jiang X X, Gao Q, Xu X H, et al. 2021 Phys. Chem. Chem. Phys. 23:21641 doi: 10.1039/D1CP03398K[7] Li C, Sun X Y, Yuan P F, et al. 2024 Phys. Lett. A 504:129435 doi: 10.1016/j.physleta.2024.129435[8] Li C, Wang F, Cui B, Pan Z F, Jia Y, 2023 J. Phys.: Condens. Matter 35:295801 doi: 10.1088/1361-648X/accdad[9] Song C, Cui B, Li F, Zhou X, Pan F, 2017 Prog. Mater. Sci. 87:33 doi: 10.1016/j.pmatsci.2017.02.002[10] Yan Y N, Zhou X J, Li F, et al. 2015 Appl. Phys. Lett. 107:122407 doi: 10.1063/1.4931752[11] Li L J, O’Farrell E C T, Loh K P, et al. 2016 Nature 529:185 doi: 10.1038/nature16175[12] Xi X, Berger H, Forró L, Shan J, Mak K F, 2016 Phys. Rev. Lett. 117:106801 doi: 10.1103/PhysRevLett.117.106801[13] Zhang X, Lu Y, Chen L, 2023 Chin. Phys. Lett. 40:67701 doi: 10.1088/0256-307X/40/6/067701[14] Wang Y, Lei Z Z, Zhang J S, et al. 2023 Chin. Phys. Lett. 40:117102 doi: 10.1088/0256-307X/40/11/117102[15] Zhang W, Wu S Y, Li L, Chen X M, 2013 Chin. Phys. Lett. 30:57701 doi: 10.1088/0256-307X/30/5/057701[16] Wurfel P, Batra I P, 1973 Phys. Rev. B 8:5126 doi: 10.1103/PhysRevB.8.5126[17] Chang K, Liu J W, Lin H C, et al. 2016 Science 353:274 doi: 10.1126/science.aad8609[18] Liu F C, You L, Seyler K L, et al. 2016 Nat. Commun. 7:12357 doi: 10.1038/ncomms12357[19] Chandrasekaran A, Mishra A, Singh A K, 2017 Nano Lett. 17:3290 doi: 10.1021/acs.nanolett.7b01035[20] Zhou Y, Wu D, Zhu Y H, et al. 2017 Nano Lett. 17:5508 doi: 10.1021/acs.nanolett.7b02198[21] Ding W J, Zhu J B, Wang Z, et al. 2017 Nat. Commun. 8:14956 doi: 10.1038/ncomms14956[22] Xiao J, Zhu H Y, Wang Y, et al. 2018 Phys. Rev. Lett. 120:227601 doi: 10.1103/PhysRevLett.120.227601[23] Xue F, Hu W J, Lee K C, et al. 2018 Adv. Funct. Mater. 28:1803738 doi: 10.1002/adfm.201803738[24] Xu M L, Huang C X, Li Y W, et al. 2020 Phys. Rev. Lett. 124:67602 doi: 10.1103/PhysRevLett.124.067602[25] Lu C L, Wu M H, Lin L, Liu J M, 2019 Natl. Sci. Rev. 6:653 doi: 10.1093/nsr/nwz091[26] Liu C, Guan S, Yin H B, et al. 2019 Appl. Phys. Lett. 115:252904 doi: 10.1063/1.5133022[27] Hua C Q, Bai H, Zheng Y, et al. 2021 Chin. Phys. Lett. 38:77501 doi: 10.1088/0256-307X/38/7/077501[28] Hill N A, 2000 J. Phys. Chem. B 104:6694 doi: 10.1021/jp000114x[29] Xu R, Liu S, Saremi S, et al. 2019 Nat. Commun. 10:1282 doi: 10.1038/s41467-019-09207-9[30] Seixas L, Rodin A S, Carvalho A, Castro Neto A H, 2016 Phys. Rev. Lett. 116:206803 doi: 10.1103/PhysRevLett.116.206803[31] Peng H W, Xiang H J, Wei S H, et al. 2009 Phys. Rev. Lett. 102:17201 doi: 10.1103/PhysRevLett.102.017201[32] Nie Y Z, Rahman M, Liu P, et al. 2017 Phys. Rev. B 96:75401 doi: 10.1103/PhysRevB.96.075401[33] Miao N, Xu B, Bristowe N C, Zhou J, Sun Z, 2017 J. Am Chem. Soc. 139:11125 doi: 10.1021/jacs.7b05133[34] Jiang X X, Zuo X, Han L, et al. 2020 Comput. Mater. Sci. 183:109799 doi: 10.1016/j.commatsci.2020.109799[35] Cao T, Li Z, Louie S G, 2015 Phys. Rev. Lett. 114:236602 doi: 10.1103/PhysRevLett.114.236602[36] Kresse G, Furthmüller J, 1996 Phys. Rev. B 54:11169 doi: 10.1103/PhysRevB.54.11169[37] Perdew J P, Burke K, Ernzerhof M, 1996 Phys. Rev. Lett. 77:3865 doi: 10.1103/PhysRevLett.77.3865[38] Grimme S, 2006 J. Comput. Chem. 27:1787 doi: 10.1002/jcc.20495[39] Bengtsson L, 1999 Phys. Rev. B 59:12301 doi: 10.1103/PhysRevB.59.12301[40] Togo A, Tanaka I, 2015 Scr. Mater. 108:1 doi: 10.1016/j.scriptamat.2015.07.021[41] Zhou J, Zeng Q, Lv D, et al. 2015 Nano Lett. 15:6400 doi: 10.1021/acs.nanolett.5b01590[42] Lee Y, Pisoni R, Overweg H, et al. 2018 2D Mater. 5:35040 doi: 10.1088/2053-1583/aacb49[43] See the Supplemental Material for crystal structures, stability calculations, Monte Carlo simulation, and additional data.[44] Sun C, Xiang H, Xu B, et al. 2016 Appl. Phys. Express 9:35203 doi: 10.7567/APEX.9.035203[45] Li X, Zuo X, Li H, et al. 2019 Phys. Chem. Chem. Phys. 21:19234 doi: 10.1039/C9CP02746G[46] Fei Z Y, Zhao W J, Palomaki T A, et al. 2018 Nature 560:336 doi: 10.1038/s41586-018-0336-3[47] Zhao Y, Zhang J J, Yuan S, Chen Z, 2019 Adv. Funct. Mater. 29:1901420 doi: 10.1002/adfm.201901420 -
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