Characteristics of Sb_6Te_4/VO_2 Multilayer Thin Films for Good Stability and Ultrafast Speed Applied in Phase Change Memory

The Sb_6Te_4/VO_2 multilayer thin films are prepared by magnetron sputtering and the potential application in phase change memory is investigated in detail. Compared with Sb_6Te_4, Sb_6Te_4/VO_2 multilayer composite thin films have higher phase change temperature and crystallization resistance, indicating better thermal stability and less power consumption. Also, Sb_6Te_4/VO_2 has a broader energy band of 1.58 eV and better data retention (125^\circ\!C for 10 y). The crystallization is suppressed by the multilayer interfaces in Sb_6Te_4/VO_2 thin film with a smaller rms surface roughness for Sb_6Te_4/VO_2 than monolayer Sb_4Te_6. The picosecond laser technology is applied to study the phase change speed. A short crystallization time of 5.21 ns is realized for the Sb_6Te_4(2 nm)/VO_2 (8 nm) thin film. The Sb_6Te_4/VO_2 multilayer thin film is a potential and competitive phase change material for its good thermal stability and fast phase change speed.