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The Influence of Au-Doping on Morphology and Visible-Light Reflectivity of TiN Thin Films Deposited by Direct-Current Reactive Magnetron Sputtering

  • Center for Condensed Matter and Materials Physics, Department of Physics, Beihang University, Beijing 100191

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  • Received Date: November 25, 2009
  • Published Date: April 30, 2010
    Abstract
  • Ti, TiN and Au-TiN (Au content: from 0.5% to 7.7%) thin films were deposited on stainless steel substrates by dc reactive magnetron sputtering with a metal Ti target. The crystal structure, surface morphology and visible-light reflectivity of the films for different film compositions are studied in detail. Distinctly different surface morphologies appear for the Ti, TiN and Au-TiN thin films. It can be observed that the surface morphology of the TiN film is affected by the Au-doping, when the Au content increases from 0% to 7.7%, surface roughness enlarges from 62.4 to 82.8 nm. Moreover, visible-light reflectivity varies significantly with increasing Au contents in the TiN films. However, the reflectivity of the TiN thin film at 550-800 nm is higher than that of the Au-TiN thin film. The present work illustrates the dependence of metal elements on the surface morphology and on the reflectivity of Au-TiN thin films. It is speculated that the addition of Au can suppress the formation and growth of TiN grains so that it changes the surface morphology and the Au-TiN thin film has potential applications in spectral selective coating.
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