Dual-Material Surrounding-Gate Metal-Oxide-Semiconductor Field Effect Transistors with Asymmetric Halo
Department of Microelectronics, School of Electronics and Information Engineering, Xi'an Jiaotong University, Xi'an 710049
Received Date:
October 08, 2008
Published Date:
December 31, 2008
Abstract
Asymmetrical halo and dual-material gate structure are used in the sub-100nm surrounding-gate metal-oxide-semiconductor field effect transistor (MOSFET) to improve the performance. Using three-region parabolic potential distribution and universal boundary condition, analytical surface potential and threshold voltage models of the novel MOSFET are developed based on the solution of Poisson's equation. The performance of the MOSFET is examined by the analytical models and the 3D numerical device simulator Davinci. It is shown that the novel MOSFET can suppress short channel effect and improve carrier transport efficiency. The derived analytical models agree well with Davinci.
Article Text
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About This Article
Cite this article:
LI Zun-Chao. Dual-Material Surrounding-Gate Metal-Oxide-Semiconductor Field Effect Transistors with Asymmetric Halo[J].
Chin. Phys. Lett. , 2009, 26(1): 018502.
DOI: 10.1088/0256-307X/26/1/018502
LI Zun-Chao. Dual-Material Surrounding-Gate Metal-Oxide-Semiconductor Field Effect Transistors with Asymmetric Halo[J]. Chin. Phys. Lett. , 2009, 26(1): 018502. DOI: 10.1088/0256-307X/26/1/018502
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