CPS Journals
中国物理学会期刊网 物理 物理学报 Chinese Physics B Chinese Physics Letters
Submit Manuscript Peer Review Get e-Alerts

Generalized Mei Conserved Quantity of Mei Symmetry for Mechanico-electrical Systems with Nonholonomic Controllable Constraints

  • Department of Physics, Henan Institute of Education, Zhengzhou 450014

More Information   | 
PDF Get Citation
  • Received Date: July 24, 2008
  • Published Date: December 31, 2008
    Abstract
  • On the basis of the total time derivative along the trajectory, we study the generalized Mei conserved quantity of Mei symmetry for mechanico-electrical systems with nonholonomic controllable constraints. Firstly, the definition and criterion of Mei symmetry for mechanico-electrical systems with nonholonomic controllable constraints are presented. Secondly, a coordination function is introduced, and the conditions of existence of generalized Mei conserved quantity as well as the forms are proposed. Lastly, an example is given to illustrate the application of the results.
    • FullText(HTML)
    • References (22)
  • [1] Noether A E 1918 Math. Phys. KI II 235
    [2] Lutzky M 1979 J. Phys. A: Math. Gen. 12 973
    [3] Mei F X 2000 J. Beijing Inst. Technol. 9 120
    [4] Luo S K 2002 Chin. Phys. Lett. 19 449
    [5] Luo S K 2003 Chin. Phys. Lett. 20 597
    [6] Mei F X 2001 Chin. Phys. 10 177
    [7] Mei F X 2003 Acta Phys. Sin. 52 1048 (inChinese)
    [8] Zheng S W, Xie J F and Jia L Q 2006 Chin. Phys.Lett. 23 2924
    [9] Luo S K 2007 Chin. Phys. Lett. 24 3017
    [10] Luo S K 2007 Chin. Phys. Lett. 24 2463
    [11] Zheng S W, Xie J F and Zhang Q H 2007 Chin. Phys.Lett. 24 2164
    [12] Zhao W J, Weng Y Q and Fu J L 2007 Chin. Phys.Lett. 24 2773
    [13] Xia L L and Li Y C 2007 Commun. Theor. Phys. 48 23
    [14] Xia L L, Li Y C, Wang J and Hou Q B 2006 Acta Phys.Sin. 55 4995 (in Chinese)
    [15] Xia L L and Li Y C 2007 Chin. Phys. 16 1516
    [16] Qiu J J 1992 Analysis Mechanics ofMechanico-Electrical System (Beijing: Science Press) p 308 (inChinese)
    [17] Mei F X, Liu D and Luo Y 1991 Advanced AnalyticalMechanics (Beijing: Beijing Institute of Technology Press) p 349(in Chinese)
    [18] Luo S K and Zhang Y F et al 2008 Advances in theStudy of Dynamics of Constrained Mechanics Systems (Beijing;Science Press) (in Chinese)
    [19] Zheng S W, Fu J L and Li X H 2005 Acta Phys. Sin. 54 5511 (in Chinese)
    [20] Li Y C, Xia L L, Liu B, Jiao Z Y and Wand X M 2008 Chin. Phys. 17 1545
    [21] Fu J L, Wang X J and Xie F P 2008 Chin. Phys.Lett. 25 2413
    [22] Fang J H, Ding N and Wang P 2007 Chin. Phys. 16 887
    • Related Articles

  • Related Articles

    [1]HU Wen-Juan, XIE Fen-Yan, CHEN Qiang, WENG Jing. Polyethylene Oxide Films Polymerized by Radio Frequency Plasma-Enhanced Chemical Vapour Phase Deposition and Its Adsorption Behaviour of Platelet-Rich Plasma [J]. Chin. Phys. Lett., 2008, 25(10): 3805-3807.
    [2]HAO Xiao-Peng, WANG Bao-Yi, YU Run-Sheng, WEI Long, WANG Hui, ZHAO De-Gang, HAO Wei-Chang. Evolution of Structural Defects in SiOx Films Fabricated by Electron Cyclotron Resonance Plasma Chemical Vapour Deposition upon Annealing Treatment [J]. Chin. Phys. Lett., 2008, 25(3): 1034-1037.
    [3]LIN Ying-Bin, YANG Yan-Min, XU Jian-Ping, LIU Xing-Chong, WANGJian-Feng, HUANG Zhi-Gao, ZHANG Feng-Ming, DU You-Wei. Photoluminescence of ZnO and Mn-Doped ZnO Polycrystalline Films Prepared by Plasma Enhanced Chemical Vapour Deposition [J]. Chin. Phys. Lett., 2007, 24(9): 2685-2688.
    [4]LIN Ying-Bin, LU Zhi-Hai, ZOU Wen-Qin, LU Zhong-Lin, XU Jian-Ping, JI Jian-Ti, LIU Xing-Chong, WANG Jian-Feng, LV Li-Ya, ZHANG Feng-Ming, DU You-Wei, HUANG Zhi-Gao, ZHENG Jian-Guo. Room-Temperature Ferromagnetic ZnMnO Thin Films Synthesized by Plasma Enhanced Chemical Vapour Deposition Method [J]. Chin. Phys. Lett., 2007, 24(7): 2085-2087.
    [5]Department of Physics, Lanzhou University, Lanzhou. Al-Induced Crystallization Growth of Si Films by Inductively Coupled Plasma Chemical Vapour Deposition [J]. Chin. Phys. Lett., 2006, 23(12): 3338-3340.
    [6]YU Wei, WANG Bao-Zhu, LU Wan-Bing, YANG Yan-Bin, HAN Li, FU Guang-Sheng. Growth of Nanocrystalline Silicon Films by Helicon Wave Plasma Chemical Vapour Deposition [J]. Chin. Phys. Lett., 2004, 21(7): 1320-1322.
    [7]LIN Xuan-Ying, HUANG Chuang-Jun, LIN Kui-Xun, YU Yun-Peng, YU Chu-Ying, CHI Ling-Fei. Low-Temperature Growth of Polycrystalline Silicon Films bySiCl4/H2 rf Plasma Enhanced Chemical Vapor Deposition [J]. Chin. Phys. Lett., 2003, 20(10): 1879-1882.
    [8]WANG Peng-Fei, DING Shi-Jin, ZHANG Wei, ZHANG Jim-Yun, WANG Ji-Tao, WEI William Lee. FTIR Characterization of Fluorine Doped Silicon Dioxide Thin Films Deposited by Plasma Enhanced Chemical Vapor Deposition [J]. Chin. Phys. Lett., 2000, 17(12): 912-914.
    [9]LIU Yi-chun, LIU Chun-guang, CHEN Da-wei, LIU Yu-xue, BAI Yu-bai, LI Tie-jin. Photoluminescence Properties of a-SiC:H Films Grown by Plasma Enhanced Chemical Vapor Deposition from SiH4+C2H2 Gas Mixtures [J]. Chin. Phys. Lett., 1998, 15(11): 837-839.
    [10]MA Tian-fu, CHEN Kun-ji, DU Jia-fang, XU Jun, LI Wei, HUANG Xin-fan. Blue Light Emission from Hydrogenated Amorphous Silicon CarbidePrepared by Xylene Source in Plasma-Enhanced Chemical Vapour Deposition System [J]. Chin. Phys. Lett., 1996, 13(12): 947-949.
    • Supplements (0)

Catalog

    Article views (1) PDF downloads (752) Cited by()
    Turn off MathJax
    Article Contents
    Abstract
    Article Text
    References
    Related Articles
    Authors
  • Guideline for Authors
  • Submit and Track a Manuscript
  • Update Your Information
  • Copyright Agreement
  • Ethical Policy
    • Referees
  • Guideline for Referees
  • Submit a Report
  • Volunteer to be a Reviewer
  • Update Your Information
  • Review Policy
    • Browse
  • Accepted
  • In Press
  • Current Issue
  • All Issues
  • Browse by Field
    • About
  • About CPL
  • Editorial Board
  • Editorial Board of Young Scientists
  • Editorial Office

    • Copyright © Chinese Physics Letters

    Address: Institute of Physics, Chinese Academy of Sciences, P.O.Box 603, Beijing 100190 China

    Tel: (86-10) 82649490 or 82649378Fax: 86-10-82649604E-mail: cpl@aphy.iphy.ac.cn

    Supported by: Beijing Renhe Information Technology Co., Ltd. 

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return