| CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
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Influence of Small-Size Contaminations on Thin Film Structural Properties |
| F. V. Grigoriev1**, V. B. Sulimov1, Jinlong Zhang2,3,4, Xinbin Cheng2,3,4, Zhanshan Wang2,3,4, A. V. Tikhonravov1 |
1Research Computing Center, M.V. Lomonosov Moscow State University, Moscow 119991, Russia
2MOE Key Laboratory of Advanced Micro-Structured Materials, Shanghai 200092
3Institute of Precision Optical Engineering, School of Physics Science and Engineering, Tongji University, Shanghai 200092
4IFSA Collaborative Innovation Center, Shanghai Jiao Tong University, Shanghai 200240
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| Cite this article: |
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F. V. Grigoriev, V. B. Sulimov, Jinlong Zhang et al 2019 Chin. Phys. Lett. 36 038101 |
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Abstract An approach for studying the influence of nano-particles on the structural properties of deposited thin films is proposed. It is based on the molecular dynamic modeling of the deposition process in the presence of contaminating nano-particles. The nano-particle is assumed to be immobile and its interaction with film atoms is described by a spherically symmetric potential. The approach is applied to the investigation of properties of silicon dioxide films. Visualization tools are used to investigate the porosity associated with nano-particles. The structure of the film near the nano-particle is studied using the radial distribution function. It is found that fluctuations of film density near the nano-particles are essentially different in the cases of low-energy and high-energy deposition processes.
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Received: 23 October 2018
Published: 24 February 2019
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| PACS: |
81.15.Aa
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(Theory and models of film growth)
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| Fund: Supported by the RFBR under Grant No 17-57-53091, and the National Natural Science Foundation of China under Grant No 11611530687. |
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