| PHYSICS OF GASES, PLASMAS, AND ELECTRIC DISCHARGES |
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Origin of Initial Current Peak in High Power Impulse Magnetron Sputtering and Verification by Non-Sputtering Discharge |
| Zhong-Zhen Wu1**, Shu Xiao1, Sui-Han Cui1, Ricky K. Y. Fu2, Xiu-Bo Tian3, Paul K. Chu2, Feng Pan1 |
1School of Advanced Materials, Peking University Shenzhen Graduate School, Shenzhen 518055
2Department of Physics and Materials Science, City University of Hong Kong, Tat Chee Avenue, Kowloon, Hong Kong
3State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001
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| Cite this article: |
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Zhong-Zhen Wu, Shu Xiao, Sui-Han Cui et al 2016 Chin. Phys. Lett. 33 075201 |
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Abstract A non-sputtering discharge is utilized to verify the effect of replacement of gas ions by metallic ions and consequent decrease in the secondary electron emission coefficient in the discharge current curves in high-power impulse magnetron sputtering (HiPIMS). In the non-sputtering discharge involving hydrogen, replacement of ions is avoided while the rarefaction still contributes. The initial peak and ensuing decay disappear and all the discharge current curves show a similar feature as the HiPIMS discharge of materials with low sputtering yields such as carbon. The results demonstrate the key effect of ion replacement during sputtering.
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Received: 01 March 2016
Published: 01 August 2016
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| PACS: |
52.25.Jm
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(Ionization of plasmas)
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52.80.Pi
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(High-frequency and RF discharges)
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52.50.Qt
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(Plasma heating by radio-frequency fields; ICR, ICP, helicons)
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