| NUCLEAR PHYSICS |
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Fabrication of Nano-Columnar Tungsten Films and Their Deuterium and Helium Ion Irradiation Effects |
| CAI Ya-Nan, HAN Wen-Jia, CHEN Zhe, YU Jian-Gang, FENG Hong-Li, ZHU Kai-Gui** |
Department of Physics, Beihang University, Beijing 100191
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| Cite this article: |
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CAI Ya-Nan, HAN Wen-Jia, CHEN Zhe et al 2014 Chin. Phys. Lett. 31 122801 |
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Abstract We fabricate nano-columnar tungsten (W) films on polycrystalline silicon substrates by magnetron sputtering using a grazing angle deposition technique. The deposition process is performed at a base pressure of 5×10?4 Pa. The intersection angle between the direction of the incident beam and the normal direction of the substrate is set as 85°. Separate as well as synergetic irradiations of 30/50 keV deuterium ions and 60 keV helium ions are carried out for the nano-columnar W. Samples of normal structure W are also irradiated under the same conditions as a comparison. Scanning electron microscopy and x-ray diffraction are used to characterize the structure of the as-prepared as well as the irradiated samples. The experimental results show that blisters are difficult to form on the surface of nano-columnar W under the irradiation conditions in this work, which could be due to the particular structure.
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Published: 12 January 2015
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| PACS: |
28.20.-v
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(Neutron physics)
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52.40.Hf
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(Plasma-material interactions; boundary layer effects)
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61.46.-w
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(Structure of nanoscale materials)
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