Harnessing Light and Single Masks to Create Multiple Patterns in a Ternary Blend with Photoinduced Reaction

doi:10.1088/0256-307X/30/7/076401

Chin. Phys. Lett.

2013, Vol. 30

Issue (7): 076401 DOI: 10.1088/0256-307X/30/7/076401

CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES

Harnessing Light and Single Masks to Create Multiple Patterns in a Ternary Blend with Photoinduced Reaction

PAN Jun-Xing, ZHANG Jin-Jun^**, WANG Bao-Feng, WU Hai-Shun, SUN Min-Na

School of Chemistry and Materials Science, Shanxi Normal University, Linfen 041004

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PAN Jun-Xing, ZHANG Jin-Jun, WANG Bao-Feng et al 2013 Chin. Phys. Lett. 30 076401

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Abstract Using cell dynamics system simulation, we provide a simple way to form differently ordered patterns in a photosensitive, immiscible ABC ternary blend. The first pattern is established by irradiating the sample through a mask, which serves to pin the non-photoactivity C regions and thereby promotes the self-assembly of A and B into ordered domains. When the mask is removed, the photoactivity of the AB blend leads to different periodic patterns. Thus, the use of one mask permits the creation of multiple ordered morphologies, which can be stable for a long time by quenching the system at the appropriate time or choosing a suitable composition ratio and mask shape. Furthermore, the influence on the morphology of the composition ratio, the shape of the mask, and the illumination intensity are studied systematically.

Received: 15 April 2013 Published: 21 November 2013

PACS:	64.75.Va	(Phase separation and segregation in polymer blends/polymeric solutions)
	64.75.Yz	(Self-assembly)
	83.80.Uv	(Block copolymers)
	83.80.Tc	(Polymer blends)

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https://cpl.iphy.ac.cn/10.1088/0256-307X/30/7/076401 OR https://cpl.iphy.ac.cn/Y2013/V30/I7/076401

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	PAN Jun-Xing
	ZHANG Jin-Jun
	WANG Bao-Feng
	WU Hai-Shun
	SUN Min-Na

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