| CROSS-DISCIPLINARY PHYSICS AND RELATED AREAS OF SCIENCE AND TECHNOLOGY |
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Theoretical Explanation and Improvement to the Flare Model of Lithography Based on the Kirk Test |
| CHEN De-Liang, CAO Yi-Ping**, HUANG Zhen-Fen
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Department of Opto-Electronics, Sichuan University, Chengdu 610065
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| Cite this article: |
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CHEN De-Liang, CAO Yi-Ping, HUANG Zhen-Fen 2011 Chin. Phys. Lett. 28 068503 |
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Abstract The Kirk test has good precision for measuring stray light in optical lithography and is the usual method of measuring stray light. However, Kirk did not provide a theoretical explanation to his simulation model. We attempt to give Kirk's model a kind of theoretical explanation and a little improvement based on the model of point spread function of scattering and the theory of statistical optics. It is indicated by simulation that the improved model fits Kirk's measurement data better.
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| Keywords:
85.40.Hp
78.35.+c
78.68.+m
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Received: 24 December 2010
Published: 29 May 2011
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| PACS: |
85.40.Hp
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(Lithography, masks and pattern transfer)
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78.35.+c
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(Brillouin and Rayleigh scattering; other light scattering)
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78.68.+m
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(Optical properties of surfaces)
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[1] Mack C A 2003 Proc. SPIE 5040 151
[2] Lai K and Progler C 2001 Proc. SPIE 4346 1424
[3] Kim Y C, Bisschop P D and Vandeberghe G 2005 J. Microlith. Microfab. Microsyst. 41 15
[4] Goodman J W 1985 Statistical Optics (New York: John Wiley & Sons) p 361
[5] Shibuya M, Ezaki H, Fukui T et al 2004 Proc. SPIE 5377 1910
[6] Progler C and Wong A 2000 Proc. SPIE 4000 40
[7] Kerkhof M V, Boeij W D, Kok H et al 2004 Proc. SPIE 5377 1960
[8] Grassman A and Moritz H 1992 J. Vac. Sci. Technol. B 10 3008
[9] Fontaine B L, Daly T P, Chapman H N et al 1996 Proc. OSA TOPS on Extreme Ultraviolet Lithography 4 203
[10] Fontaine B L, Dusa M, Acheta A et al 2002 Proc. SPIE 4691 44
[11] Kirk J P1994 Proc. SPIE 2197 566
[12] Goodman J W 1985 Statistical Optics (New York: John Wiley & Sons) p 392
[13] Stearns D G, Gaines D P and Sweeney D W 1998 Appl. Opt. 84 1003
[14] Lin Z W, Xu X, Zhang X J and Fang G Y 2011 Chin. Phys. Lett. 28 014101
[15] Li H X, Liu C X, Chen X Y, Zhang M N and Cheng C F 2011 Chin. Phys. Lett. 28 024206
[16] James W V, Jerome B, Yorick T et al 2004 Proc. SPIE 5567 700
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