| CONDENSED MATTER: STRUCTURE, MECHANICAL AND THERMAL PROPERTIES |
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Epitaxial Growth of Si(111)/Er2O3 (111) Structure on Si(111) by Molecular Beam Epitaxy |
| XU Run1**, TANG Min-Yan1, ZHU Yan-Yan2, WANG Lin-Jun1
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1School of Materials Science and Engineering, Shanghai University, Shanghai 200072
2Department of Mathematics and Physics, Shanghai University of Electric Power, Shanghai 200090
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| Cite this article: |
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XU Run, TANG Min-Yan, ZHU Yan-Yan et al 2011 Chin. Phys. Lett. 28 036801 |
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Abstract The Si overlayers are grown by molecular beam epitaxy on atomically smooth Er2O3(111) films prepared on Si(111) substrates. Single crystalline Si overlayers are achieved and are evident due to the spot-like reflective high energy electron diffraction (RHEED) patterns and x-ray diffraction patterns. The epitaxial relationship of the Si overlayer along the surface with respect to the orientation of Er2O3 and the Si substrate is as follows: overgrown Si(111)//Er2O3(111)//Si(111). The rough surface of Si overlayers, as identified by both RHEED patterns and atomic force microscopy images, indicates a three-dimensional growth mode. The reason for this is based on the interfacial energy argument. Further growth of Er2O3 films on this rough Si overlayer leads to the polycrystalline nature of the topmost Er2O3 layer.
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| Keywords:
68.35.Ct
68.55.A-
68.35.B-
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Received: 11 July 2010
Published: 28 February 2011
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| PACS: |
68.35.Ct
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(Interface structure and roughness)
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68.55.A-
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(Nucleation and growth)
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68.35.B-
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(Structure of clean surfaces (and surface reconstruction))
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