CONDENSED MATTER: ELECTRONIC STRUCTURE, ELECTRICAL, MAGNETIC, AND OPTICAL PROPERTIES |
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Performance of Organic Field Effect Transistors with Self-Improved Cu/Organic Interfaces |
HU Zi-Yang1,2, CHENG Xiao-Man1,2,3, WU Ren-Lei1,2, WANG Zhong-Qiang1,2, YIN Shou-Gen 1,2 |
1Institute of Material Physics, Tianjin University of Technology, Tianjin 3003842Key Laboratory of Display Material and Photoelectric Devices (Ministry of Education), Tianjin University of Technology, Tianjin 3003843School of Science, Tianjin University of Technology, Tianjin 300384 |
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Cite this article: |
HU Zi-Yang, CHENG Xiao-Man, WU Ren-Lei et al 2009 Chin. Phys. Lett. 26 037305 |
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Abstract We fabricate pentacene-based organic field effect transistors (OFETs) with Cu as source and drain (S-D) electrodes. The fabricated devices stored for ten hours under ambient atmospheric conditions exhibit superior performance compared with the as-prepared devices. The field-effect mobility increases from 0.012 to 0.03cm2V-1s-1, and the threshold voltage downshifts from -14 to -9V. The on/off current ratios are close to the order of 104. The improved performance of the stored devices is attributed to the formation of thin Cu oxide at the Cu electrodes/organic interfaces. These results suggest a simple and available way to optimize device properties and to reduce fabrication cost for OFETs.
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Keywords:
73.30.+y
73.40.Cg
85.30.Tv
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Received: 26 September 2008
Published: 19 February 2009
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PACS: |
73.30.+y
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(Surface double layers, Schottky barriers, and work functions)
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73.40.Cg
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(Contact resistance, contact potential)
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85.30.Tv
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(Field effect devices)
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[1] Crone B et al 2000 Nature 403 521 [2] Hu Y C, Dong G F, Wang L D, Liang Y and Qiu Y 2004 Chin. Phys. Lett. 21 723 [3] Liu P et al 2006 J. Am. Chem. Soc. 128 4554 [4] Di C A et al 2008 Adv. Mater. 20 1286 [5] Chesterfield R J et al 2004 J. Appl. Phys. 956396 [6] Fadlallah M, Benzarti W, Billiot G, Eccleston W andBarclay D 2006 J. Appl. Phys. 99 104505 [7] Koch N and Kahn A 2003 Appl. Phys. Lett. 82 70 [8] Watkins N.J, Yan L and Gao Y 2002 Appl. Phys. Lett. 80 4384 [9] Gao W and Kahn A 2003 J. Appl. Phys. 94 359 [10] Dong G F, Liu Q D, Wang L D and Qiu Y 2005 Chin.Phys. Lett 22 8 [11] Murdoch G B, Greine M, Helander M G, Wang Z B and Lu Z H2008 Appl. Phys. Lett. 93 083309 [12] Chu C W, Li S H, Chen C W, Shrotriya V and Yang Y 2005 Appl. Phys. Lett. 87 193508 [13] Yagi I, Tsukagoshi K and Aoyagi Y 2004 Appl. Phys.Lett. 84 813 [14] Seo S, Park B N and Evans P G 2006 Appl. Phys.Lett. 88 232114 |
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Abstract
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