Chin. Phys. Lett.  2004, Vol. 21 Issue (11): 2132-2135    DOI:
Original Articles |
Dependence of Structure and Haemocompatibility of Amorphous Carbon Films on Substrate Bias Voltage
GUO Yang-Ming;MO Dang;LI Zhe-Yi;LIU Yi;HE Zhen-Hui;CHEN Di-Hu
State Key Laboratory of Optoelectronic Materials and Technologies, Department of Physics, Sun Yat-Sen University, Guangzhou 510275
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GUO Yang-Ming, MO Dang, LI Zhe-Yi et al  2004 Chin. Phys. Lett. 21 2132-2135
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Abstract Tetrahedral amorphous hydrogenated carbon (ta-C:H) films on Si(100) substrates were prepared by using a magnetic-field-filter plasma stream deposition system. Samples with different ratios of sp3-bond to sp2-bond were obtained by changing the bias voltage applied to the substrates. The ellipsometric spectra of various carbon films in the photon energy range of 1.9--5.4eV were measured. The refractive index n and the relative sp3 C ratio of these films were obtained by simulating their ellipsometric spectra using the Forouhi--Bloomer model and by using the Bruggeman effective medium approximation, respectively. The haemocompatibility of these ta-C:H films was analysed by observation of platelet adhesion and measurement of kinetic clotting time. The results show that the sp3 C fraction is dependent on the substrate bias voltage, and the haemocompatibility is dependent on the ratio of sp3-bond to sp2-bond. A good haemocompatibility material of ta-C:H films with a suitable sp3 C fraction can be prepared by changing the substrate bias voltage.

Keywords: 07.60.Fs      68.55.-a      87.80.+s     
Published: 01 November 2004
PACS:  07.60.Fs (Polarimeters and ellipsometers)  
  68.55.-a (Thin film structure and morphology)  
  87.80.+s  
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https://cpl.iphy.ac.cn/       OR      https://cpl.iphy.ac.cn/Y2004/V21/I11/02132
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GUO Yang-Ming
MO Dang
LI Zhe-Yi
LIU Yi
HE Zhen-Hui
CHEN Di-Hu
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