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Ordered InAs Quantum Dots with Controllable Periods Grown on Stripe-Patterned GaAs Substrates |
| REN Yun-Yun1;XU Bo1;WANG Zhan-Guo1;LIU-Ming2;LONG Shi-Bing2 |
| 1Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 1000832Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences,Beijing 100029 |
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REN Yun-Yun, XU Bo, WANG Zhan-Guo et al 2007 Chin. Phys. Lett. 24 2689-2691 |
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Abstract GaAs (001) substrates are patterned by electron beam lithography and wet chemical etching to control the nucleation of InAs quantum dots (QDs). InAs dots are grown on the stripe-patterned substrates by solid source molecular beam epitaxy. A thick buffer layer is deposited on the strip pattern before the deposition of InAs. To enhance the surface diffusion length of the In atoms, InAs is deposited with low growth rate and low As pressure. The AFM images show that distinct one-dimensionally ordered InAs QDs with homogeneous size distribution are created, and the QDs preferentially nucleate along the trench. With the increasing amount of deposited InAs and the spacing of the trenches, a number of QDs are formed beside the trenches. The distribution of additional QDs is long-range ordered, always along the trenchs rather than across the spacing regions.
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| Keywords:
81.15.Hi
68.55.Jk
81.05.Ea
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Received: 12 April 2007
Published: 16 August 2007
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