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Analysis and Determination of Refractive Index Profiles of O2+ Ion-Implanted LiNbO3 Planar Waveguide Using Etching and Ellipsometry Techniques |
| LIU Han-Ping;LU Fei1;WANG Xue-Lin2;YANG Tian-Lin3;LV Ying-Bo3;LI Yan-Hui3;LIU Xiang-Zhi1;ZHANG Rui-Feng1;SONG Qiang1;MA Xue-Jian2 |
| 1School of Information Science and Engineering, Shandong University, Jinan 2501002School of Physics and Microelectronics, Shandong University, Jinan 2501003Department of Space Science and Applied Physics, ShandongUniversity, Weihai 264209 |
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| Cite this article: |
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LIU Han-Ping, LU Fei, WANG Xue-Lin et al 2008 Chin. Phys. Lett. 25 156-159 |
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Abstract The refractive index profiles of 3MeV O2+ ion-implanted planar waveguides in lithium niobate are reconstructed based on etching and ellipsometry techniques. SRIM2003 code is used to simulate the damage distribution in waveguide. It is demonstrated that the index profile of this kind of waveguide, extending to several micrometres in depth, can be determined by
etching in combination with following ellipsometric measurements. A good agreement is found between the simulated damage distributions in waveguide and the index profiles based on experimental data, and the
width of refractive index barrier is wider than the result of SRIM2003.
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| Keywords:
42.79.Gn
61.80.Jh
52.77.Bn
07.60.Fs
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Received: 18 October 2007
Published: 27 December 2007
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