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Instability Parameters of Optical Oscillation Frequency in Plasma Central Discharge and Periphery Region |
ZHOU Zhu-Wen1;M. A. LIEBERMAN2;Sungjin KIM2 |
1Department of Physics, Guizhou Educational College, Guiyang 550003
2Department of Electrical Engineering and Computer Sciences-1770, University of California, Berkeley CA 94720, USA |
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Cite this article: |
ZHOU Zhu-Wen, M. A. LIEBERMAN, Sungjin KIM 2006 Chin. Phys. Lett. 23 2251-2254 |
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Abstract We have observed relaxation oscillations in a capacitive discharge in Ar gas, connected to a peripheral ground chamber. The plasma oscillations observed from time-varying optical emission from the main discharge chamber show, for example, a high frequency (75.37kHz) relaxation oscillation, at 100mTorr and 8W absorbed power, and a low frequency (2.72Hz) relaxation oscillation, 100mTorr and 325W absorbed power. Time-varying optical emission intensity and plasma density are also detected with a Langmuir probe. The theoretical result agrees well with experiments.
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Published: 01 August 2006
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