2012, Vol. 29(1): 18501-018501    DOI: 10.1088/0256-307X/29/1/018501
	Reactive Radiofrequency Sputtering-Deposited Nanocrystalline ZnO Thin-Film Transistors
	LI Shao-Juan1,3, HE Xin1, HAN De-Dong1, SUN Lei1, WANG Yi1, HAN Ru-Qi1 , CHAN Man-Sun2, ZHANG Sheng-Dong1,3**
	1Institute of Microelectronics, Peking University, Beijing 100871 2Hong Kong University of Science and Technology, Hong Kong 3Shenzhen Graduate School, Peking University, Shenzhen 518055
	收稿日期 2011-09-27  修回日期 1900-01-01
	Supporting info
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