2012, Vol. 29(1): 12501-012501    DOI: 10.1088/0256-307X/29/1/012501
Thermal Annealing Behavior of Helium in Ti Films Deposited by Magnetron Sputtering
ZHANG Lei, HE Zhi-Jiang, LIU Chao-Zhuo, WANG Xu-Fei, SHI Li-Qun**
Applied Ion Beam Physics Laboratory, Institute of Modern Physics, Fudan University, Shanghai 200433
收稿日期 2011-07-30  修回日期 1900-01-01
Supporting info
[1] Ullmaier H 1983 Proc. Int. Symp. on Fundamental Aspects of Helium in Metals New YorkUllmaier H 1983 Proc. Int. Symp. on Fundamental Aspects of Helium in Metals (New York: Plenum)
[2] Lucas A A 1984 Physical B+C 127 225
[3] Donnelly S E and Evans J H 1991 Fundamental Aspects of Inert Gases in Solids (New York: Plenum)
[4] Cowgill D F 2005 Fusion Sci. Technol. 48 539
[5] Markwitz A, Johnson P B, Gilberd P W and Collins G A 2002 Nucl. Instrum. Methods B 190 718
[6] Johnson P B, Markwitz A and Gilberd P W 2001 Adv. Mater. 13 997
[7] Rajainmäki H, Linderoth S, Hansen H E, Nieminen R M and Bentzon M D 1988 Phys. Rev. B 38 1087
[8] Shi L Q, Liu C Z, Xu S L and Zhou Z Y 2005 Thin Solid Films 479 52
[9] Zheng H, Liu S, Yu H B, Wang L B, Liu C Z and Shi L Q 2005 Mater. Lett. 59 10715
[10] Jensen K O, Eldrup M, Singh B N and Victoria M 1988 J. Phys. F: Met. Phys. 18 1069
[11] Grynszpan A R I, Baclet N, Darque A, Flament J L, Zielinski F, Anwand W and Brauer G 2006 Appl. Surf. Sci. 252 3252
[12] Nagata S, Takahiro K and Yamaguchi S 1998 Nucl. Instrum. Methods B 136 680
[13] Liu C Z and Shi L Q 2004 Chin. Phys. Lett. 21 1035
[14] Stoquert J P and Szorenyi T 2002 Phys. Rev. B 66 144108
[15] Yu H B, Liu S, Hu K Y, Wang L B and Rong L J 2005 Atomic Energy Science and Technology 39 530
[16] Thwaites D I and Watt D E 1978 Phys. Med. Biol. 23 426