2011, Vol. 28(6): 64211-064211    DOI: 10.1088/0256-307X/28/6/064211
	Comparative Studies on the Laser Damage Resistance of Ta2O5 and Nb2O5 Films Performed under Different Electron Beam Currents
	XU Cheng1,2**, XU Lin-Min1, ZHANG Han-Zhuo1, QIANG Ying-Huai1, ZHU Ya-Bo1, LIU Jiong-Tian2, SHAO Jian-Da3
	1School of Materials Science and Engineering, China University of Mining and Technology, Xuzhou 221116 2School of Chemical Engineering and Technology, China University of Mining and Technology, Xuzhou 221116 3Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
	收稿日期 2010-12-03  修回日期 1900-01-01
	Supporting info
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