2011, Vol. 28(3): 36108-036108 DOI: 10.1088/0256-307X/28/3/036108 | ||
Deep Energy Levels Formed by Se Implantation in Si | ||
GAO Li-Peng, HAN Pei-De**, MAO Xue, FAN Yu-Jie, HU Shao-Xu, ZHAO Chun-Hua, MI Yan-Hong | ||
State Key Laboratory on Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 |
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收稿日期 2010-09-02 修回日期 1900-01-01 | ||
Supporting info | ||
[1] Pavesi L and Lockwood D J 2004 Silicon Photonics (Berlin: Springer-Verlag) [2] Park H et al 2007 Opt. Exp. 15 13539 [3] Ahn D et al 2007 Opt. Express 15 3916 [4] Bradley J D B et al 2005 Appl. Phys. Lett. 86 241103 [5] Geis M W et al 2007 IEEE Photon. Technol. Lett. 19 152 [6] Geis M W et al 2007 Opt. Express 15 16886 [7] Knights A P et al 2006 J. Vac. Sci. Technol. A 24 783 [8] Lang D V 1974 J. Appl. Phys. 45 3023 [9] Grimmeiss H G et al 1980 J. Appl. Phys. 51 3740 [10] Grimmeiss H G and Skarstam B 1981 Phys. Rev B 23 1947 [11] Richou F et al 1977 Appl. Phys. Lett. 31 525 |
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