2011, Vol. 28(2): 28103-028103 DOI: 10.1088/0256-307X/28/2/028103 | ||
Effect of Substrate Temperature on the Structural, Electrical and Optical Properties of Nanocrystalline Silicon Films in Hot-Filament Chemical Vapor Deposition | ||
GUO Xiao-Song, ZHANG Shan-Shan, BAO Zhong, ZHANG Hong-Liang, CHEN Chang-Cheng, LIU Li-Xin, LIU Yan-Xia, XIE Er-Qing** | ||
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Physical Science and Technology School, Lanzhou University, Lanzhou 730000 |
||
收稿日期 2010-09-10 修回日期 1900-01-01 | ||
Supporting info | ||
[1] Veprek S and Maecek V 1968 Solid-State Electron. 11 683 [2] Meirav U et al 1990 Phys. Rev. Lett. 65 771 [3] Matins R et al 1997 Thin Solid Films 303 47 [4] He Y L et al 1994 J. Appl. Phys. 75 797 [5] Yamamoto K et al 1990 Mater. Res. Soc. Sym. Proc. 164 161 [6] Sheng S R et al 2001 Mater. Res. Soc. Sym. Proc. 664 A23.4.1 [7] Losurdo M et al 2000 J. Appl. Phys. 88 2408 [8] Iqbal Z and Vepiek S 1982 J. Phys. C: Solid State Phys. 15 377 [9] Veprek S et al 1987 Phys. Rev. B 36 3344 [10] Yue G et al 1999 Appl. Phys. Lett. 75 492 [11] Veprek S et al 1982 Phil. Mag. B 45 137 [12] Matsumura H et al 2001 Jpn. J. Appl. Phys. 40 L289 [13] Heya A et al 2000 J. Non-Cryst. Solids 266–269 619 [14] Yamada A et al 1989 Jpn. J. Appl. Phys. 28 L2284 [15] Tsai C C et al 1989 Mater. Res. Sot. Sym. Proc. 149 297 [16] Hu Y H et al 2005 Chin. Phys. 14 1457 [17] Wagner H and Beyer W 1983 Solid State Commun. 48 585 [18] Liu G H et al 2007 Chin. Phys. 16 588 [19] Webb J D et al 1999 Mater. Res. Soc. Sym. Proc. 557 311 [20] David L Y et al 2007 Appl. Phys. Lett. 90 081923 [21] Tauc J et al 1966 Phys. Status Solidi 15 627 [22] Wu Y et al 1996 Phys. Rev. Lett. 77 2049 [23] Koyel Bhattacharya and Das D 2008 J. Phys. D: Appl. Phys. 41 155420 [24] Grebner S et al 1993 Mater. Res. Soc. Sym. Proc. 283 513 [25] Petritz R L 1956 Phys. Rev. 104 1508 [26] Seto J Y W 1975 J. Appl. Phys. 46 5247 [27] Baccarani G et al 1978 J. Appl. Phys. 49 5565 |
||