2011, Vol. 28(2): 28102-028102    DOI: 10.1088/0256-307X/28/2/028102
	Influence of N2 Flux on InN Film Deposition on Sapphire (0001) Substrates by ECR-PEMOCVD
	ZHOU Zhi-Feng1,2, QIN Fu-Wen1,2**, ZANG Hai-Rong1,2, ZHANG Dong1,2, CHEN Wei-Ji1,2, ZHI An-Bo1,2, LIU Xing-Long1,2, YU Bo1,2, JIANG Xin2,3
	1School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 2Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of Education), Dalian University of Technology, Dalian 116024 3Institute of Materials Engineering, University of Siegen, Paul-Bonatz-Straße 9-11, D-57076 Siegen, Germany
	收稿日期 2010-11-29  修回日期 1900-01-01
	Supporting info
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