2011, Vol. 28(1): 18101-018101    DOI: 10.1088/0256-307X/28/1/018101
	Simulation of Interference Nanolithography of Second-Exciting Surface-Plasmon Polartions for Metal Nanograting Fabrication
	LIANG Hui-Min1**, WANG Jing-Quan2
	1College of Science, Hebei University of Engineering, Handan 056038 2Department of Physics, Sichuan University, Chengdu 610064
	收稿日期 2010-06-22  修回日期 1900-01-01
	Supporting info
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