2008, Vol. 25(5): 1818-1821    DOI:
Sinusoidal Steady State Analysis on 4H--SiC Buried Channel MOSFETs
ZHANG Tao, LU Hong-Liang, ZHANG Yi-Men, ZHANG Yu-Ming, YE Li-Hui
Microelectronics Institute, Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices of Ministry of Education, Xidian University, Xi'an 710071
收稿日期 2007-09-26  修回日期 1900-01-01
Supporting info

[1] Lv H L, Zhang Y M, Zhang Y M and Yang L A 2004 IEEE
Trans. Electron Devices 51 1065

[2] Gudjonsson G, Allerstam F, Olafsson H O, Nilsson P \AA\
et al 2006 IEEE Electron Device Lett. 27 469

[3] Schorner R, Friedrichs P, Peters D and Stephani D 1999 IEEE
Electron Device Lett. 20 241

[4] Das M K, Um B S and Cooper J A Jr 2000 Mater. Sci. Forum
338 1069

[5] Afanasev V V, Bassler M, Pensl G and Schulz M 1997
Phys. Status Solidi A 162 321

[6] Harada S, Suzuki S and Senzaki J 2001 IEEE Electron Device
Lett. 22 272

[7] Jaeger R C andGaensslen F H 1980 IEEE Trans. Electron Devices
27 914

[8] Caughey D M and Thomas R E 1967 Proc. IEEE 52 2192

[9] Ruff M, Mitlehner H and Helbig R 1994 IEEE Trans. Electron
Devices 41 1040

[10] Roschke M, Schwierz F 2001 IEEE Trans. Electron Devices
48 1442

[11] Laux S E 1985 IEEE Trans. Electron Devices 32 2028

[12] Mason S J 1954 Trans. IRE Professional Group on Circuit
Theory 1 20

[13] Madhu S G 1992 IEEE Trans. Microwave Theor. Tech. 40
864

[14] Sheppard S T, Melloch M R and Cooper J A Jr 1994 IEEE Trans.
Electron Devices 41 1257

[15] Sheppard S T, Melloch M R and Cooper J A Jr 1996 IEEE
Electron Device Lett. 17 4