2008, Vol. 25(12): 4364-4367 DOI: | ||
Effect of Nitridation on Morphology, Structural Properties and Stress of AlN Films | ||
HU Wei-Guo, JIAO Chun-Mei, WEI Hong-Yuan, ZHANG Pan-Feng, KANG Ting-Ting, ZHANG Ri-Qing, LIU Xiang-Lin | ||
Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, Chinese Academy of Sciences, PO Box 912, Beijing 100083 | ||
收稿日期 2008-08-04 修回日期 1900-01-01 | ||
Supporting info | ||
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