2008, Vol. 25(12): 4466-4468    DOI:
Growth, Antimony Incorporation Behaviour and Beryllium Doping of GaAs1-ySby Grown on GaAs by Molecular Beam Epitaxy
GAO Han-Chao, WANG Wen-Xin, JIANG Zhong-Wei, LIU Jian, YANG Cheng-Liang, WU Dian-Zhong, ZHOU Jun-Ming, CHEN Hong
Beijing National Laboratory for Condensed Matter Physics, Institute of physics, Chinese Academy of Sciences, Beijing 100190
收稿日期 2008-04-11  修回日期 1900-01-01
Supporting info

[1] Peter M et al 1999 Appl. Phys. Lett. 74 410

[2] Dvorak M W et al 2001 IEEE Electron. Devices Lett.
22 361

[3] Tohruoka et al 2001 Appl. Phys. Lett. 78 483

[4] Dvorak M W et al 2000 J. Vac. Sci. Technol. A
18 761

[5] Renard C et al 2005 J. Cryst. Growth 278 193

[6] Genty F et al 1999 J. Cryst. Growth 201-202
1024

[7] Seki H and Koukitu A 1986 J. Cryst. Growth 78
342

[8] Yu Egorov A et al 1998 J. Cryst. Growth 188 69

[9] Nomura T et al 1991 J. Cryst. Growth 111 61

[10] Liang B W and Tu C W 1993 J. Appl. Phys. 74
255

[11] Hao Z B et al 2001 J. Cryst. Growth 224 224

[12] Wu S D et al 2004 J. Cryst. Growth 270 359

[13] Oka T et al 2001 Appl. Phys. Lett. 78 483

[14] Oda Y et al 2005 Appl. Phys. Lett. 87 023503

[15] Tian Y and Wang H 2006 J. Cryst. Growth 270
359

[16] Andr\'{e R, Wey S and Tu C W 2002 J. Cryst. Growth
235 65